⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13685365 | 0.72 | — | — | |
| SCHEMBL13685518 | 0.69 | — | — | |
| SCHEMBL727839 | 0.67 | — | — | |
| SCHEMBL344851 | 0.64 | — | — | |
| SCHEMBL9852 | 0.64 | — | — | |
| SCHEMBL7111729 | 0.64 | — | — | |
| Norflurane SCHEMBL11036325 | 0.61 | — | — | |
| Norflurane SCHEMBL5466910 | 0.61 | — | — | |
| Norflurane SCHEMBL1173735 | 0.61 | — | — | |
| Norflurane SCHEMBL9499 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3141538-B1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | VERSUM MAT US LLC (US) | 2019-10-30 | — | — | EP | disclosed |
| EP-2318477-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-06-05 | — | — | EP | disclosed |
| EP-3141538-A1 | IMPROVED PROCESS STABILITY OF NBDE USING SUBSTITUTED PHENOL STABILIZERS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-03-15 | — | — | EP | disclosed |
| EP-2141141-B1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PROD & CHEM (US) | 2016-09-28 | — | — | EP | disclosed |
| EP-1931613-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-11-11 | — | — | EP | disclosed |
| EP-1931746-B1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS (US) | 2013-09-04 | — | — | EP | disclosed |
| US-8252704-B2 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2012-08-28 | — | — | US | disclosed |
| US-8173213-B2 | Process stability of NBDE using substituted phenol stabilizers | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-05-08 | — | — | US | disclosed |
| US-20110259242-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2011-10-27 | — | — | US | disclosed |
| US-7985350-B2 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2011-07-26 | — | — | US | disclosed |
| US-20110091651-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2011-04-21 | — | — | US | disclosed |
| US-7883639-B2 | stabilized cyclic alkene composition comprising cyclic alkenes and antioxidant compound to reduce or eliminate residue formation upon evaporation of such compositions; used to form dielectric films | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2011-02-08 | — | — | US | disclosed |
| US-7871536-B2 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2011-01-18 | — | — | US | disclosed |
| WO-2007033075-A9 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-04-29 | — | — | WO | disclosed |
| WO-2010005937-A1 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2010-01-14 | — | — | WO | disclosed |
| EP-2141141-A1 | Improved Process Stability of NBDE Using Substituted Phenol Stabilizers | Air Products and Chemicals, Inc. (US) | 2010-01-06 | — | — | EP | disclosed |
| US-20090297711-A1 | Process Stability of NBDE Using Substituted Phenol Stabilizers | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-20090291210-A1 | Additives to Prevent Degradation of Cyclic Alkene Derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-11-26 | — | — | US | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |