SCHEMBL1059296

SCHEMBL1059296

C=CC(=O)OC(C)C(=C)C

nearest known ligand 0.43

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 11/20 0.43
ALDH1A1 P00352 5/20 0.38
TP53 P04637 3/20 0.33
HPGD P15428 1/20 0.33
HIF1A Q16665 2/20 0.32
CYP3A4 P08684 1/20 0.32
HSD17B10 Q99714 1/20 0.32
HCAR2 Q8TDS4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10024379 0.84 TSHR (0.45) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL27794908 0.84 TSHR (0.45) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL16070994 0.82 TSHR (0.43) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL29240160 0.82 TSHR (0.43) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL5665734 0.81 TSHR (0.46) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL9176510 0.80 TSHR (0.42) TSHRALDH1A1TP53HPGDHIF1A
Methacrylic Acid SCHEMBL28074349 0.79 TSHR (0.38) TSHRALDH1A1HCAR2
SCHEMBL37396 0.79 TSHR (0.45) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL16520914 0.79 TSHR (0.45) TSHRALDH1A1TP53HPGDHIF1A
SCHEMBL2184214 0.79 TSHR (0.45) TSHRALDH1A1TP53HPGDHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107107593-B The manufacturing method of noninflammability decoration sheet, metal finishing component and metal finishing component 凸版印刷株式会社 2019-11-19 CN disclosed
CN-109964328-A Composition for forming organic electroluminescent element, and method for producing organic film 三菱化学株式会社 2019-07-02 CN disclosed
CN-105319634-B Phase difference film 住友化学株式会社 2019-05-10 CN disclosed
CN-109661855-A Photosensitive resin composition for forming organic electroluminescent element partition wall, organic electroluminescent element, image display device, and illumination 三菱化学株式会社 2019-04-19 CN disclosed
CN-109562633-A Coating composition for gloss ink-absorbing medium 路博润先进材料公司 2019-04-02 CN disclosed
CN-109414916-A Formed body comprising acrylic resin composition 株式会社可乐丽 2019-03-01 CN disclosed
CN-109312162-A Thermoplastic resin composition, formed body, film and laminated body 株式会社可乐丽 2019-02-05 CN disclosed
CN-109154688-A Polarizing plate 住友化学株式会社 2019-01-04 CN disclosed
CN-105473653-B cellulose acylate film, polarizing plate and liquid crystal display device 柯尼卡美能达株式会社 2018-07-17 CN disclosed
CN-105849599-B Cellulose ester membrane, its manufacturing method and polarizer 柯尼卡美能达株式会社 2018-06-15 CN disclosed
EP-2270580-A2 Polarization light splitting film, backlight system and liquid crystal display DAI NIPPON PRINTING CO., LTD. (JP) 2011-01-05 EP disclosed
US-RE40655-E1 Polarization light splitting film, backlight system and liquid crystal display having particular diffusion layer under optical rotational selection layer DAI NIPPON PRINTING CO., LTD. (JP) 2009-03-10 US disclosed
US-7342619-B2 Polarization light splitting film, backlight system and liquid crystal display DAI NIPPON PRINTING CO., LTD. (JP) 2008-03-11 US disclosed
US-20030164906-A1 Polarization light splitting film, backlight system and liquid crystal display DAI NIPPON PRINTING CO., LTD. 2003-09-04 US disclosed
US-6559911-B2 Polarization light splitting film, backlight system and liquid crystal display having particular diffusion layer under optical rotation selection layer DAI NIPPON PRINTING CO., LTD. (JP) 2003-05-06 US disclosed
US-20020003593-A1 POLARIZATION LIGHT SPLITTING FILM, BACKLIGHT SYSTEM AND LIQUID CRYSTAL DISPLAY DAI NIPPON PRINTING CO., LTD. (JP) 2002-01-10 US disclosed
EP-0859265-A2 Polarization light splitting film, backlight system DAI NIPPON PRINTING CO., LTD. (JP) 1998-08-19 EP disclosed
EP-0220652-B1 Method for manufacturing phase gratings of a combination pattern-refraction modification type KURARAY CO (JP) 1994-02-02 EP disclosed
US-4777116-A RADIATION OF A MASKED THIN FILM OF A (METH)ACRYLATE POLYMER AND REACTIVE AROMATIC ALDEHYDE AND KETONE KURARAY CO., LTD. (JP) 1988-10-11 US disclosed
EP-0220652-A2 Method for manufacturing phase gratings of a combination pattern-refraction modification type Kuraray Co., Ltd. (JP) 1987-05-06 EP disclosed