SCHEMBL105954

SCHEMBL105954

[H+].[N-]=[N+]=[N-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9005288 0.89
SCHEMBL165 0.89
SCHEMBL1512953 0.89
SCHEMBL25266468 0.80 CA1 (0.80)
SCHEMBL25225739 0.80 CA1 (0.80)
SCHEMBL25241775 0.80 CA1 (0.80)
SCHEMBL25267093 0.80 CA1 (0.80)
SCHEMBL25231872 0.80 CA1 (0.80)
SCHEMBL25267014 0.80 CA1 (0.80)
SCHEMBL25223811 0.80 CA1 (0.80)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1421 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026106846-A1 METHOD FOR TUNGSTEN-BASED THIN FILM DEPOSITION VIA FABRICATION AND DECOMPOSITION OF PRECURSOR METASTABLE COMPLEXES (MOLECULAR SPECIES) KALARK NANOSTRUCTURE SCIENCES INC. (US) 2026-05-21 WO claimed
US-20260132506-A1 METHOD FOR TUNGSTEN-BASED THIN FILM DEPOSITION VIA FABRICATION AND DECOMPOSITION OF PRECURSOR METASTABLE COMPLEXES (MOLECULAR SPECIES) KALARK NANOSTRUCTURE SCIENCES INC (US) 2026-05-14 US claimed
EP-3887419-B1 POLYURETHANE-FOAMED FORMULATIONS AND NOISE INSULATIONS WITH FOAMS BASED THEREON ADLER PELZER HOLDING GMBH (DE) 2025-10-29 EP claimed
US-12398469-B2 Methods and systems for producing conformal thin films KALARK NANOSTRUCTURE SCIENCES INC. (US) 2025-08-26 US claimed
WO-2025111518-A1 METHODS AND SYSTEMS FOR CONFORMAL THIN FILM MANUFACTURING KALARK NANOSTRUCTURE SCIENCES INC. (US) 2025-05-30 WO claimed
US-20250163584-A1 METHODS AND SYSTEMS FOR PRODUCING CONFORMAL THIN FILMS KALARK NANOSTRUCTURE SCIENCES INC. 2025-05-22 US claimed
CN-114657535-B Method for forming transition metal niobium nitride film on substrate by atomic layer deposition and related semiconductor device structure ASM IP控股有限公司 2024-11-12 CN claimed
CN-110176393-B Method for forming silicon nitride film using microwave plasma 应用材料公司 2024-07-30 CN claimed
US-12043692-B2 Polyurethane-foamed formulations and noise insulations with foams based thereon ADLER PELZER HOLDING GMBH (DE) 2024-07-23 US claimed
US-11955331-B2 Method of forming silicon nitride films using microwave plasma APPLIED MATERIALS, INC. (US) 2024-04-09 US claimed
EP-0466927-A1 METHOD AND APPARATUS FOR PROCESSING NITROGEN OXIDE GAS. MEIDENSHA ELECTRIC MFG CO LTD (JP) 1992-01-22 EP claimed
EP-0248420-B1 BENZOPYRAN DERIVATIVES DAIICHI SEIYAKU CO., LTD. (JP) 1991-09-18 EP claimed
WO-1991012070-A1 METHOD AND APPARATUS FOR PROCESSING NITROGEN OXIDE GAS KABUSHIKI KAISHA MEIDENSHA (JP) 1991-08-22 WO claimed
US-4908107-A Process for preparing fluorinated vinyl ethers HOECHST AKTIENGESELLSCHAFT (DE) 1990-03-13 US claimed
EP-0248420-A2 Benzopyran derivatives DAIICHI SEIYAKU CO., LTD. (JP) 1987-12-09 EP claimed
EP-0035046-B1 NOVEL TETRAZOLE DERIVATIVES, PROCESS FOR THE PREPARATION THEREOF, AND ANTI-ULCER COMPOSITION CONTAINING THE SAME OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1985-10-02 EP claimed
US-4421829-A Hydrogen azide-oxygen fuel cell BOHANNON ROBERT C 1983-12-20 US claimed
EP-0035046-A1 Novel tetrazole derivatives, process for the preparation thereof, and anti-ulcer composition containing the same OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1981-09-09 EP claimed
US-4254214-A BLACK, REDUCTION OF COPPER SALT OR COMPLEX TO COPPER FUJI PHOTO FILM CO., LTD. (JP) 1981-03-03 US claimed
US-4165773-A FROM FLUORINE ATOMS AND AZIDE RADICALS ROCKWELL INTERNATIONAL CORPORATION (US) 1979-08-28 US claimed