⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8511134 | 0.75 | — | — | |
| SCHEMBL4870244 | 0.72 | — | — | |
| SCHEMBL8591536 | 0.71 | — | — | |
| SCHEMBL22478 | 0.71 | — | — | |
| Methylamine SCHEMBL30023004 | 0.69 | — | — | |
| SCHEMBL29486245 | 0.69 | — | — | |
| SCHEMBL4660651 | 0.68 | — | — | |
| Potassium Ion SCHEMBL134248 | 0.68 | — | — | |
| SCHEMBL6378515 | 0.68 | — | — | |
| SCHEMBL951299 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240240066-A1 | REACTIVE ADHESIVE TAPE THAT CAN BE STAMPED | TESA SE (DE) | 2024-07-18 | — | — | US | disclosed |
| EP-4397545-A2 | RIGID CABLE HARNESS WITH A CURABLE SLEEVE AND METHOD FOR FORMING SUCH CABLE HARNESS | TESA SE (DE) | 2024-07-10 | — | — | EP | disclosed |
| US-20240206322-A1 | OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE | KANEKA CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-4363514-A1 | REACTIVE ADHESIVE TAPE THAT CAN BE STAMPED | TESA SE (DE) | 2024-05-08 | — | — | EP | disclosed |
| US-11965121-B2 | UV-curable adhesive tape and method for jacketing elongated items, especially leads | TESA SE (DE) | 2024-04-23 | — | — | US | disclosed |
| US-20240117223-A1 | POLYVINYL AROMATE-POLYDIENE-BLOCK COPOLYMER-BASED ADHESIVE COMPOUNDS HAVING IMPROVED THERMAL SHEAR STRENGTH | TESA SE (DE) | 2024-04-11 | — | — | US | disclosed |
| US-20240106046-A1 | METHOD FOR CLADDING A BATTERY CELL | TESA SE (DE) | 2024-03-28 | — | — | US | disclosed |
| US-11926769-B2 | Storage-stable, reactive, pressure-sensitive adhesive tape | TESA SE (DE) | 2024-03-12 | — | — | US | disclosed |
| US-11866614-B2 | Pressure-sensitive adhesive compound containing a cross-linked nanoparticle network, method of production and use thereof | TESA SE (DE) | 2024-01-09 | — | — | US | disclosed |
| US-20230408923-A1 | SUBSTRATE LAMINATE, IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATE | KANEKA CORPORATION (JP) | 2023-12-21 | — | — | US | disclosed |
| US-20090252932-A1 | ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF | KURARAY CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090234072-A1 | CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| EP-1923431-A1 | CURABLE COMPOSITION | Kaneka Corporation (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-20070189671-A1 | Method for manufacturing optical waveguide chip | SR CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-7162131-B2 | Radiation-curable composition, optical waveguide and method for formation thereof | JSR CORPORATION (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20060165362-A1 | Radiation curable composition, optical waveguide and method for formation thereof | JSR CORPORATION (JP) | 2006-07-27 | — | — | US | disclosed |
| US-7005231-B2 | Positive type radiosensitive composition and method for forming pattern | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| EP-1605021-A1 | RADIATION CURABLE COMPOSITION, OPTICAL WAVEGUIDE AND METHOD FOR FORMATION THEREOF | JSR Corporation (JP) | 2005-12-14 | — | — | EP | disclosed |
| US-20040197698-A1 | Positive type radiosensitive composition and method for forming pattern | JSR CORPORATION (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1411390-A1 | POSITIVE TYPE RADIOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN | JSR Corporation (JP) | 2004-04-21 | — | — | EP | disclosed |