SCHEMBL106200

SCHEMBL106200

CCCO[Si](OCCC)(OCCC)C1CCCCC1

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.33
ADH1A P07327 1/20 0.31
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30
SHBG P04278 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL104165 1.00 CYP1A2 (0.33) CYP1A2ADH1ACYP2D6CYP2C19SHBG
SCHEMBL105106 0.98 CYP1A2 (0.31) CYP1A2CYP2D6CYP2C19
SCHEMBL30576991 0.94 CYP1A2 (0.30) CYP1A2
SCHEMBL30576994 0.94 CYP1A2 (0.30) CYP1A2
SCHEMBL105137 0.93
SCHEMBL28804731 0.90 CYP1A2 (0.30) CYP1A2
SCHEMBL105099 0.88
SCHEMBL907210 0.87 CYP1A2 (0.40) CYP1A2
SCHEMBL23494122 0.85 CYP1A2 (0.39) CYP1A2
SCHEMBL2494452 0.84 CYP1A2 (0.37) CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 345 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117866204-B Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-12-13 CN claimed
CN-117866204-A Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN claimed
CN-117866205-A Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN claimed
WO-2021118145-A1 METHOD FOR PREPARING OLEFIN-BASED POLYMER BY GAS-PHASE POLYMERIZATION 한화솔루션 주식회사 2021-06-17 WO claimed
CN-107325394-B Polypropylene composition and high-performance flame-retardant antistatic polypropylene pipe 中国石油化工股份有限公司 2020-09-15 CN claimed
CN-107325411-B Flame-retardant antistatic random copolymerization polypropylene composition and pipe 中国石油化工股份有限公司 2020-09-15 CN claimed
CN-107325395-B Polypropylene composition and flame-retardant antistatic pipe 中国石油化工股份有限公司 2020-07-24 CN claimed
CN-105623075-B A kind of preparation method of the impact polypropylene material of high fondant-strength 中国石油化工股份有限公司 2018-10-16 CN claimed
CN-106317610-B A kind of high fondant-strength impact polypropylene expanded material and preparation method 中国石油化工股份有限公司 2018-09-21 CN claimed
CN-105622819-B A kind of preparation method of the impact polypropylene material of high fondant-strength 中国石油化工股份有限公司 2018-09-21 CN claimed
CN-106317610-A High-melt-strength impact-resistant polypropylene foaming material and preparation method thereof 中国石油化工股份有限公司 2017-01-11 CN claimed
CN-106317612-A Impact-resistant polypropylene foaming material with high-melt strength and preparation method thereof 中国石油化工股份有限公司 2017-01-11 CN claimed
CN-106280018-A A kind of high fondant-strength impact polypropylene expanded material, prepare and apply 中国石油化工股份有限公司 2017-01-04 CN claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
CN-103788256-B A kind of preparation method of high fluidity of molten high rigidity impact polypropylene 中国石油化工股份有限公司 2016-08-17 CN claimed
CN-105622819-A Method for preparing impact-resistant polypropylene material with high melt strength CHINA PETROLEUM & CHEM CORP 2016-06-01 CN claimed
CN-105623075-A Method for preparing impact-resistant polypropylene material with high melt strength CHINA PETROLEUM & CHEM CORP 2016-06-01 CN claimed
CN-105623077-A Impact-resistant polypropylene material with high melt strength and preparation method therefor CHINA PETROLEUM & CHEM CORP 2016-06-01 CN claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
CN-103788256-A Preparation method of high-melt fluidity high-rigidity antishock polypropylene CHINA PETROLEUM & CHEMICAL 2014-05-14 CN claimed