Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Malonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Malonic Acid SCHEMBL108824 | 0.96 | — | — | |
| Malonic Acid SCHEMBL29467206 | 0.96 | CA4 (0.91) | — | |
| Malonic Acid SCHEMBL66611 | 0.96 | — | — | |
| Malonic Acid SCHEMBL28314403 | 0.92 | — | — | |
| Malonic Acid SCHEMBL28820463 | 0.92 | CA4 (0.83) | — | |
| Malonic Acid SCHEMBL28315716 | 0.92 | — | — | |
| Malonic Acid SCHEMBL107186 | 0.92 | — | — | |
| Malonic Acid SCHEMBL106339 | 0.92 | — | — | |
| Malonic Acid SCHEMBL31591233 | 0.92 | — | — | |
| Malonic Acid SCHEMBL28610335 | 0.88 | CA4 (0.77) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 132 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3624236-B1 | CATHODE FOR LITHIUM-SULFUR BATTERY, AND LITHIUM-SULFUR BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-04-22 | — | — | EP | claimed |
| US-20200203756-A1 | CATHODE FOR LITHIUM-SULFUR BATTERY, AND LITHIUM-SULFUR BATTERY COMPRISING SAME | LG CHEM, LTD. (KR) | 2020-06-25 | — | — | US | claimed |
| EP-3624236-A1 | CATHODE FOR LITHIUM-SULFUR BATTERY, AND LITHIUM-SULFUR BATTERY COMPRISING SAME | LG Chem, Ltd. (KR) | 2020-03-18 | — | — | EP | claimed |
| CN-110800136-A | Positive electrode for lithium-sulfur battery and lithium-sulfur battery comprising same | 株式会社LG化学 | 2020-02-14 | — | — | CN | claimed |
| WO-2013028574-A2 | AQUEOUS LITHIUM AIR BATTERIES | POLYPLUS BATTERY COMPANY (US) | 2013-02-28 | — | — | WO | claimed |
| CN-115458808-B | Method for producing lithium fluorosulfonate, nonaqueous electrolyte solution, and nonaqueous electrolyte secondary battery | 三菱化学株式会社 | 2026-05-15 | — | — | CN | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-3624236-B1 | CATHODE FOR LITHIUM-SULFUR BATTERY, AND LITHIUM-SULFUR BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-04-22 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-3825278-B1 | METHOD FOR PREPARING HIGH-PURITY BISFLUOROSULFONYLIMIDE SALT | SHANGHAI ROLECHEM CO LTD (CN) | 2025-12-17 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| EP-2011829-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-1867681-B1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHINETSU CHEMICAL CO (JP) | 2008-12-31 | — | — | EP | disclosed |
| US-20080274432-A1 | SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-06 | — | — | US | disclosed |
| US-20080026322-A1 | Hydrolytic condensation of organosilicon compound using acid and basic catalyst with Group 1a hydroxide, organic acid and solvent; efficiency patterning photoresist film | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| EP-1867681-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-12-19 | — | — | EP | disclosed |
| EP-1845132-A2 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Shinetsu Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070238300-A1 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-10-11 | — | — | US | disclosed |
| EP-0558311-A1 | Light-sensitive lithographic printing plate | KONICA CORPORATION (JP) | 1993-09-01 | — | — | EP | disclosed |