SCHEMBL1064197

SCHEMBL1064197

C=C[Si](OCC)(OCC)C(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5833491 0.83
SCHEMBL5833398 0.83 TSHR (0.32)
SCHEMBL1065655 0.81
SCHEMBL931777 0.81
SCHEMBL5834209 0.79 HPGD (0.33)
SCHEMBL1068556 0.79
SCHEMBL930829 0.79
SCHEMBL5834786 0.77
SCHEMBL1067052 0.77
SCHEMBL5072678 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1566835-B1 INSULATING FILM MATERIAL CONTAINING ORGANIC SILANE OR ORGANIC SILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE TOSOH CORP (JP) 2012-08-01 EP claimed
US-7935425-B2 Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device TOSOH CORPORATION (JP) 2011-05-03 US claimed
CN-100444330-C Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device TOSOH CORP (JP) 2008-12-17 CN claimed
US-20060151884-A1 Insulatng film material containing organic silane or organic siloxane compound, method for produing sane, and semiconductor device TOSOH CORPORATION (JP) 2006-07-13 US claimed
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
EP-2278612-B1 Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device TOSOH CORP (JP) 2014-12-10 EP disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
CN-102947393-A Typical metal containing polysiloxane composition, process for production of same, and uses thereof TOSOH CORP 2013-02-27 CN disclosed
EP-1566835-B1 INSULATING FILM MATERIAL CONTAINING ORGANIC SILANE OR ORGANIC SILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE TOSOH CORP (JP) 2012-08-01 EP disclosed
US-7935425-B2 Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device TOSOH CORPORATION (JP) 2011-05-03 US disclosed
EP-1566835-A1 INSULATING FILM MATERIAL CONTAINING ORGANIC SILANE OR ORGANIC SILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE Tosoh Corporation (JP) 2005-08-24 EP disclosed
US-20050020845-A1 Process of producing alkoxysilanes TOAGOSEI CO., LTD. (JP) 2005-01-27 US disclosed
CN-1555380-A Process for preparing alkoxysilanes 东亚合成株式会社 2004-12-15 CN disclosed
EP-1428828-A1 PROCESS FOR PREPARATION OF ALKOXYSILANES TOAGOSEI CO., LTD. (JP) 2004-06-16 EP disclosed
US-5594079-A COORDINATION CATALYST CONTAINING BORON, STEREOREGULAR POLYPROPYLENE TOSOH CORPORATION (JP) 1997-01-14 US disclosed
US-5489634-A EFFICIENT SELECTIVE CATALYTIC POLYMERIZATION OF ALPHA-OLEFINS YIELDS HIGH MOLECULAR WEIGHT SPHERICAL PARTICLES HAVING HIGH BULK DENSITY, CONTROLLED PARTICLE SIZE AND MOLECULAR WEIGHT DISTRIBUTION TOSOH CORPORATION (JP) 1996-02-06 US disclosed
EP-0582278-A2 Method for producing a polyolefin TOSOH CORPORATION (JP) 1994-02-09 EP disclosed
EP-0530814-A1 Method for producing a stereospecific polyolefin TOSOH CORPORATION (JP) 1993-03-10 EP disclosed