Known targets — ChEMBL curated mechanism
CHRM1DRD2DRD3DRD4HDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR2APDE3ASIGMAR1
The experimentally established mechanism targets of Lactic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| D-Lactic Acid SCHEMBL28117891 | 1.00 | — | — | |
| Lactic Acid SCHEMBL1229318 | 1.00 | TP53 (0.92) | — | |
| L-Lactic Acid SCHEMBL28205954 | 1.00 | — | — | |
| Lactic Acid SCHEMBL1954971 | 1.00 | TP53 (0.92) | — | |
| Lactic Acid SCHEMBL9839744 | 1.00 | TP53 (0.92) | — | |
| Lactic Acid SCHEMBL36407 | 1.00 | — | — | |
| Lactic Acid SCHEMBL3684748 | 1.00 | TP53 (0.92) | — | |
| Lactic Acid SCHEMBL9052975 | 0.96 | — | — | |
| Lactic Acid SCHEMBL11222321 | 0.96 | — | — | |
| Lactic Acid SCHEMBL9640553 | 0.96 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105295924-B | Removal of titanium nitride hard mask and etch residues | 弗萨姆材料美国有限责任公司 | 2017-12-15 | — | — | CN | claimed |
| CN-115377377-A | Lithium-niobium-titanium cathode-lithium manganese iron phosphate anode lithium ion battery | 湖州永兴新能源有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-105295924-B | Removal of titanium nitride hard mask and etch residues | 弗萨姆材料美国有限责任公司 | 2017-12-15 | — | — | CN | disclosed |
| EP-2263996-B1 | PROCESS FOR PRODUCING DIAMINE AND POLYAMIDE | TORAY INDUSTRIES (JP) | 2016-09-14 | — | — | EP | disclosed |
| US-8334411-B2 | Process for producing diamine and polyamide | TORAY INDUSTRIES, INC. (JP) | 2012-12-18 | — | — | US | disclosed |
| EP-2459606-A1 | HYBRID COPOLYMER COMPOSITIONS | Akzo Nobel N.V. (NL) | 2012-06-06 | — | — | EP | disclosed |
| EP-2459607-A1 | HYBRID COPOLYMER COMPOSITIONS FOR PERSONAL CARE APPLICATIONS | Akzo Nobel N.V. (NL) | 2012-06-06 | — | — | EP | disclosed |
| WO-2011017223-A1 | HYBRID COPOLYMER COMPOSITIONS FOR PERSONAL CARE APPLICATIONS | AKZO NOBEL N.V. (NL) | 2011-02-10 | — | — | WO | disclosed |
| WO-2011014783-A1 | HYBRID COPOLYMER COMPOSITIONS | AKZO NOBEL N.V. (NL) | 2011-02-03 | — | — | WO | disclosed |
| US-20110004018-A1 | PROCESS FOR PRODUCING DIAMINE AND POLYAMIDE | TORAY INDUSTRIES, INC. (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2263996-A1 | PROCESS FOR PRODUCING DIAMINE AND POLYAMIDE | Toray Industries, Inc. (JP) | 2010-12-22 | — | — | EP | disclosed |