⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1068047 | 1.00 | — | — | |
| SCHEMBL5001157 | 1.00 | — | — | |
| SCHEMBL16859484 | 1.00 | — | — | |
| SCHEMBL1617640 | 1.00 | — | — | |
| SCHEMBL16859482 | 1.00 | — | — | |
| SCHEMBL261833 | 1.00 | — | — | |
| SCHEMBL16859481 | 1.00 | — | — | |
| SCHEMBL16859473 | 0.80 | — | — | |
| SCHEMBL16859477 | 0.80 | — | — | |
| SCHEMBL16859480 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | claimed |
| US-7935425-B2 | Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device | TOSOH CORPORATION (JP) | 2011-05-03 | — | — | US | claimed |
| US-11807758-B2 | Siloxane polymer and method of producing siloxane polymer | JNC CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| CN-115181223-B | Low-gloss matte auxiliary agent, preparation method thereof and molded body | 铨盛聚碳科技股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| US-20210371827-A1 | METHOD FOR PREPARING CANCER STEM CELL SPHEROIDS | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2021-12-02 | — | — | US | disclosed |
| US-20210238419-A1 | SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER | JNC CORPORATION (JP) | 2021-08-05 | — | — | US | disclosed |
| US-20210017499-A1 | SILOXANE POLYMER-BASED CANCER STEM CELL PREPARATION METHOD | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2021-01-21 | — | — | US | disclosed |
| CN-112239748-A | Method or kit for preparing cancer stem cell spheroids and method for screening drugs | 韩国科学技术院 | 2021-01-19 | — | — | CN | disclosed |
| CN-111630158-A | Method for preparing cancer stem cell spheroids | 韩国科学技术院 | 2020-09-04 | — | — | CN | disclosed |
| WO-2019151625-A1 | METHOD FOR PREPARING CANCER STEM CELL SPHEROIDS | 한국과학기술원 | 2019-08-08 | — | — | WO | disclosed |
| US-9793547-B2 | Lithium secondary battery and method for producing same | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2017-10-17 | — | — | US | disclosed |
| US-20170130195-A1 | CELL CULTURE SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND USE THEREOF | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2017-05-11 | — | — | US | disclosed |
| US-20150188141-A1 | LITHIUM SECONDARY BATTERY AND METHOD FOR PRODUCING SAME | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2015-07-02 | — | — | US | disclosed |
| EP-2278612-B1 | Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device | TOSOH CORP (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-7935425-B2 | Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device | TOSOH CORPORATION (JP) | 2011-05-03 | — | — | US | disclosed |
| EP-2278612-A2 | Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device | Tosoh Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| US-20060151884-A1 | Insulatng film material containing organic silane or organic siloxane compound, method for produing sane, and semiconductor device | TOSOH CORPORATION (JP) | 2006-07-13 | — | — | US | disclosed |
| EP-1566835-A1 | INSULATING FILM MATERIAL CONTAINING ORGANIC SILANE OR ORGANIC SILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | Tosoh Corporation (JP) | 2005-08-24 | — | — | EP | disclosed |