⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15915095 | 0.79 | — | — | |
| SCHEMBL1316552 | 0.74 | — | — | |
| SCHEMBL1065420 | 0.74 | — | — | |
| SCHEMBL1066529 | 0.71 | — | — | |
| SCHEMBL1066780 | 0.71 | — | — | |
| SCHEMBL1068558 | 0.70 | — | — | |
| SCHEMBL1066950 | 0.70 | — | — | |
| SCHEMBL1066830 | 0.69 | — | — | |
| SCHEMBL930677 | 0.65 | — | — | |
| SCHEMBL8953615 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1566835-B1 | INSULATING FILM MATERIAL CONTAINING ORGANIC SILANE OR ORGANIC SILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | TOSOH CORP (JP) | 2012-08-01 | — | — | EP | claimed |
| CN-100444330-C | Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device | TOSOH CORP (JP) | 2008-12-17 | — | — | CN | claimed |
| EP-2584005-B1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | TOSOH CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-9512272-B2 | Curable composition containing silicone, and cured product thereof | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20150322211-A1 | Curable Composition Containing Silicone, and Cured Product Thereof | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-12 | — | — | US | disclosed |
| CN-102947393-B | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2015-03-11 | — | — | CN | disclosed |
| EP-2278612-B1 | Material composed of organosilane or organosiloxane compound for insulating film, its production method and semiconductor device | TOSOH CORP (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8907038-B2 | Typical metal containing polysiloxane composition, process for its production, and its uses | TOSOH CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| EP-2584005-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | Tosoh Corporation (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-20130090447-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES | TOSOH CORPORATION (JP) | 2013-04-11 | — | — | US | disclosed |
| CN-102947393-A | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2013-02-27 | — | — | CN | disclosed |
| CN-1296374-C | Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes | HOKKO CHEM IND CO (JP) | 2007-01-24 | — | — | CN | disclosed |
| CN-1837221-A | Production processes for triorganomonochlorosilanes | HOKKO CHEM IND CO (JP) | 2006-09-27 | — | — | CN | disclosed |
| US-20060151884-A1 | Insulatng film material containing organic silane or organic siloxane compound, method for produing sane, and semiconductor device | TOSOH CORPORATION (JP) | 2006-07-13 | — | — | US | disclosed |
| US-7015292-B2 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2006-03-21 | — | — | US | disclosed |
| CN-1717792-A | Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device | TOSOH CORP (JP) | 2006-01-04 | — | — | CN | disclosed |
| EP-1566835-A1 | INSULATING FILM MATERIAL CONTAINING ORGANIC SILANE OR ORGANIC SILOXANE COMPOUND, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | Tosoh Corporation (JP) | 2005-08-24 | — | — | EP | disclosed |
| CN-1612886-A | Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes | HOKKO CHEM IND CO (JP) | 2005-05-04 | — | — | CN | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |
| US-20050038214-A1 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2005-02-17 | — | — | US | disclosed |