SCHEMBL10659

SCHEMBL10659

CCC1(CO)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL28164531 0.97 EPHX1 (0.52)
SCHEMBL29739832 0.97
Oxirane SCHEMBL28865425 0.95 EPHX1 (0.50)
Methoxymethane SCHEMBL28296588 0.93 EPHX1 (0.48)
SCHEMBL3330280 0.93 EPHX1 (0.48)
SCHEMBL11177747 0.93 EPHX1 (0.48)
SCHEMBL21839289 0.91 EPHX1 (0.73)
SCHEMBL43917 0.90 EPHX1 (0.44)
SCHEMBL29010368 0.89 EPHX1 (0.44)
SCHEMBL3187825 0.89 EPHX1 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 11257 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4182375-B1 RELEASABLE COMPOSITIONS BASED ON POLYACETALS DELO INDUSTRIE KLEBSTOFFE GMBH & CO KGAA (DE) 2026-05-20 EP claimed
CN-122029213-A Electron beam curable compositions for producing coil coatings 佩什托普公司 2026-05-12 CN claimed
US-12583830-B2 Synthesis method for synthesizing oxetane derivative by microreactor CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) 2026-03-24 US claimed
US-20260064002-A1 PHOTOSENSITIVE COMPOSITION AND FILM PREPARED FROM THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2026-03-05 US claimed
US-12565560-B2 Releasable compositions based on polyacetals DELO INDUSTRIE KLEBSTOFFE GMBH & CO. KGAA (DE) 2026-03-03 US claimed
US-12488909-B2 Oxygen and moisture barrier compositions and related methods UNIVERSITY OF MASSACHUSETTS (US) 2025-12-02 US claimed
WO-2025242780-A1 A LED CURABLE COMPOSITION PERSTORP AB (SE) 2025-11-27 WO claimed
US-12378425-B2 Thermosetting compositions and forming three-dimensional objects therefrom STRATASYS, INC. (US) 2025-08-05 US claimed
EP-4112610-B1 SYNTHESIS METHOD FOR SYNTHESIZING OXETANE DERIVATIVE BY MICROREACTOR CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN) 2025-07-30 EP claimed
US-12344703-B2 Photo radiation curable epoxy for electrical components HITACHI ENERGY LTD (CH) 2025-07-01 US claimed
EP-1165708-A1 RADIATION CURABLE WATER BASED CATIONIC INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2002-01-02 EP claimed
US-6322892-B1 A) AN EPOXY GROUP-CONTAINING COMPOUND AND OPTIONALLY AN OXETANE COMPOUND; B) A MODIFIED DIMETHYLSILICONE OIL; C) A CATION-POLYMERIZATION INITIATOR WHICH FORMS A CATION BY IRRADIATION OR BY HEATING. KANSAI PAINT CO., LTD. (JP) 2001-11-27 US claimed
US-6232361-B1 DERIVED BY COMBINING CYCLOALIPHATIC EPOXY COMPOUND WITH WATER COMPATIBLE EPOXIDES OR OXETANES, AND WATER; USEFUL IN INK JET, GRAVURE AND FLEXOGRAPHIC PRINTING SUN CHEMICAL CORPORATION 2001-05-15 US claimed
US-6166101-A Ultraviolet-curing coating composition for cans KANSAI PAINT CO., LTD. (JP) 2000-12-26 US claimed
US-6166100-A Cationically polymerizable pigmented composition KANSAI PAINT CO., LTD. (JP) 2000-12-26 US claimed
WO-2000034400-A1 RADIATION CURABLE WATER BASED CATIONIC INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2000-06-15 WO claimed
EP-0345073-A1 Poly (3-(Substituted)-3(Hydroxymethyl) oxetane) and method of preparing same ARIZONA BOARD OF REGENTS (US) 1989-12-06 EP claimed
US-4833183-A FILMS, FIBERS, MOLDING MATERIALS EXPLOSIVES ARIZONA BOARD OF REGENTS (US) 1989-05-23 US claimed
US-4472550-A NONIONIC SURFACTANTS BAYER AKTIENGESELLSCHAFT (DE) 1984-09-18 US claimed
US-4189562-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-02-19 US claimed