SCHEMBL10663142

CC(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)OP(=O)(OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(C)F)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(C)F

nearest known ligand 0.31

Predicted protein targets (top 3)

	gene	UniProt	supporting neighbours	confidence
▸	KDM4E	B2RXH2	1/20	0.31

▸	TSHR	P16473	1/20	0.31

▸	TDP1	Q9NUW8	1/20	0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compound	similarity	top predicted	shared targets
SCHEMBL5024293	0.98	KDM4E (0.31)	KDM4ETSHRTDP1
SCHEMBL1972130	0.89	—	—
SCHEMBL10660469	0.85	KDM4E (0.36)	KDM4ETSHRTDP1
SCHEMBL3915427	0.85	KDM4E (0.36)	KDM4ETSHRTDP1
SCHEMBL10660665	0.85	KDM4E (0.36)	KDM4ETSHRTDP1
SCHEMBL7120346	0.85	KDM4E (0.36)	KDM4ETSHRTDP1
SCHEMBL10657539	0.85	KDM4E (0.36)	KDM4ETSHRTDP1
Ammonia Solution, Strong SCHEMBL1972129	0.83	KDM4E (0.35)	KDM4ETSHRTDP1
SCHEMBL5014604	0.82	KDM4E (0.37)	KDM4ETSHRTDP1
SCHEMBL5016145	0.82	KDM4E (0.37)	KDM4ETSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

Patent	Title	Assignee	Published	Priority	Filing	Country	Status
CN-120044750-A	Mask surface anti-sticking treatment method and mask copying method	中国科学院光电技术研究所	2025-05-27	—	—	CN	claimed
CN-120044750-A	Mask surface anti-sticking treatment method and mask copying method	中国科学院光电技术研究所	2025-05-27	—	—	CN	disclosed
US-4736051-A	REACTING MONOALKALI SALT OF ORGANOPHOSPHORIC MONOESTER WITH EPOXY COMPOUND	KAO CORPORATION (JP)	1988-04-05	—	—	US	disclosed