SCHEMBL106790

SCHEMBL106790

CO[SbH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7262873 0.68
Methoxymethane SCHEMBL868 0.61
Methoxymethane SCHEMBL5707121 0.61
Methoxymethane SCHEMBL12190176 0.61
Methoxymethane SCHEMBL16998540 0.61
Methoxymethane SCHEMBL23300783 0.55
Methoxymethane SCHEMBL1347303 0.55
Methoxymethane SCHEMBL23803961 0.55
Methoxymethane SCHEMBL17377404 0.55
Methoxymethane SCHEMBL4447861 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102527371-A SCR denitrification catalyst and the fabrication method thereof using titania hydrate slurry KOREA INST SCI & TECH 2012-07-04 CN claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-18 US disclosed
EP-4592299-A1 SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-30 EP disclosed
US-20250237953-A1 SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-24 US disclosed
US-12332565-B2 Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-06-17 US disclosed
US-12332567-B2 Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-06-17 US disclosed
US-12174541-B2 Composition for forming silicon-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-12-24 US disclosed
US-20240319598-A1 Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-09-26 US disclosed
EP-1854820-A1 PROCESS FOR CONTINUOUS PRODUCTION OF POLYESTER, POLYESTER PREPOLYMER GRANULE AND POLYESTER Mitsubishi Chemical Corporation (JP) 2007-11-14 EP disclosed
CN-1950425-A Method for producing elastomeric copolyesters ZIMMER AG (DE) 2007-04-18 CN disclosed
US-7048995-B2 Polyester resin, molded product made thereof and process for production of polyester resin MITSUBISHI CHEMICAL CORPORATION (JP) 2006-05-23 US disclosed
CN-1500073-A Method for producing acrylic acid or methacrylic acid by gas phase oxidation of propane or isobutane 巴斯福股份公司 2004-05-26 CN disclosed
US-20040086733-A1 Polyester resin, molded product made thereof and process for production of polyester resin MITSUBISHI CHEMICAL CORPORATION (JP) 2004-05-06 US disclosed
US-6703474-B2 USING COMPOSITE OXIDE CATALYST MITSUBISHI CHEMICAL CORPORATION (JP) 2004-03-09 US disclosed
US-20030144459-A1 Polyester resin, molded product made thereof and process for production of polyester resin MITSUBISHI CHEMICAL CORPORATION (JP) 2003-07-31 US disclosed
EP-1281725-A1 POLYESTER RESIN, MOLDED ARTICLE THEREOF, AND PROCESS FOR PRODUCING POLYESTER RESIN MITSUBISHI CHEMICAL CORPORATION (JP) 2003-02-05 EP disclosed
CN-1033037-C Process for preparation of polybutylene terephthalate based polymer KOREA INST SCI & TECH (KR) 1996-10-16 CN disclosed
CN-1067662-A The preparation method of polybutylene terephthalate based polyalcohol KOREA INST SCI & TECH (KR) 1993-01-06 CN disclosed