SCHEMBL10684166

SCHEMBL10684166

CCCCCCC(F)C(F)(F)C(F)(F)[C](F)F

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.41
LMNA P02545 1/20 0.38
FAAH O00519 7/20 0.34
CES1 P23141 5/20 0.34
GPR84 Q9NQS5 3/20 0.34
CES2 O00748 3/20 0.34
FDPS P14324 3/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
KMT2A Q03164 1/20 0.34
HSD17B10 Q99714 1/20 0.34
SPHK1 Q9NYA1 1/20 0.34
FFAR1 O14842 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10440071 1.00 MAPT (0.41) MAPTLMNAFAAHCES1GPR84
SCHEMBL18191286 1.00 MAPT (0.41) MAPTLMNAFAAHCES1GPR84
SCHEMBL6656044 0.98 MAPT (0.38) MAPTLMNAFAAHCES1GPR84
SCHEMBL5198247 0.92 MAPT (0.31) MAPTFDPS
SCHEMBL3867750 0.87 MAPT (0.36) MAPTLMNAFAAHFDPS
SCHEMBL7783413 0.85 MAPT (0.35) MAPTLMNA
SCHEMBL7779861 0.84 MAPT (0.34) MAPTLMNA
SCHEMBL5899322 0.84 MAPT (0.34) MAPTLMNA
SCHEMBL7780918 0.84 MAPT (0.34) MAPTLMNA
SCHEMBL7782737 0.84 MAPT (0.34) MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022082041-A1 IMPROVED FLOCCULANTS UNIVERSITY OF KENTUCKY RESEARCH FOUNDATION (US) 2022-04-21 WO claimed
US-4778866-A MONOMER OF FLUORINATED ALKYL ESTERS OF ACRYLIC AND METHACRYLIC ACIDS; DIELECTRIC FOR HIGH VOLTAGE CABLES; TREEING MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1988-10-18 US claimed
EP-0209299-A1 Copolymers of ethylene and unsaturated ester MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1987-01-21 EP claimed
CN-114040939-B Composite particle and method for producing composite particle 凸版印刷株式会社 2023-10-31 CN disclosed
US-20230320972-A1 COMPOSITE PARTICLES, METHOD OF PRODUCING COMPOSITE PARTICLES AND DRY POWDER OF COMPOSITE PARTICLES, SKIN APPLICATION COMPOSITION AND METHOD OF PRODUCING THE SKIN APPLICATION COMPOSITION TOPPAN INC. (JP) 2023-10-12 US disclosed
WO-2023124471-A1 MULTI-SOURCE WASTE RESIDUE-BASED 3D CONCRETE PRINTING MATERIAL AND PREPARATION METHOD THEREFOR 中国十七冶集团有限公司 2023-07-06 WO disclosed
US-11685799-B2 Composite particles, method of producing composite particles, dry powder, and molding resin composition TOPPAN PRINTING CO., LTD. (JP) 2023-06-27 US disclosed
CN-111566130-B Composite particle, method for producing composite particle, dry powder, and resin composition for molding 凸版印刷株式会社 2023-01-24 CN disclosed
WO-2023276585-A1 METHOD FOR PRODUCING COMPOSITE PARTICLE, AND COMPOSITE PARTICLE 凸版印刷株式会社 2023-01-05 WO disclosed
EP-3995514-A1 COMPOSITE PARTICLE AND METHOD FOR PRODUCING COMPOSITE PARTICLE TOPPAN INC. (JP) 2022-05-11 EP disclosed
WO-2022082041-A1 IMPROVED FLOCCULANTS UNIVERSITY OF KENTUCKY RESEARCH FOUNDATION (US) 2022-04-21 WO disclosed
US-20200397687-A1 COMPOSITE PARTICLES, METHOD OF PRODUCING COMPOSITE PARTICLES AND DRY POWDER OF COMPOSITE PARTICLES, SKIN APPLICATION COMPOSITION AND METHOD OF PRODUCING THE SKIN APPLICATION COMPOSITION TOPPAN PRINTING CO.,LTD. (JP) 2020-12-24 US disclosed
WO-2020246510-A1 COMPOSITE PARTICLE AND METHOD FOR PRODUCING SAME, PERSONAL CARE PRODUCT, PARTICLES FOR PERSONAL CARE AND METHOD FOR PRODUCING SAME, PERSONAL CARE GOODS, AND COMPOSITION FOR PERSONAL CARE 凸版印刷株式会社 2020-12-10 WO disclosed
EP-3736297-A1 COMPOSITE PARTICLES, PRODUCTION METHOD FOR COMPOSITE PARTICLES, DRY POWDER, AND RESIN COMPOSITION FOR MOLDING Toppan Printing Co., Ltd. (JP) 2020-11-11 EP disclosed
US-20200332040-A1 COMPOSITE PARTICLES, METHOD OF PRODUCING COMPOSITE PARTICLES, DRY POWDER, AND MOLDING RESIN COMPOSITION TOPPAN PRINTING CO., LTD. (JP) 2020-10-22 US disclosed
CN-111566130-A Composite particle, method for producing composite particle, dry powder, and resin composition for molding 凸版印刷株式会社 2020-08-21 CN disclosed
CN-111263917-A Negative photosensitive resin composition, cured film, organic EL display, and method for producing same 东丽株式会社 2020-06-09 CN disclosed
WO-2019227319-A1 FLUORINE-CONTAINING POLYCAPROLACTONE FILM AND PREPARATION METHOD THEREFOR 南通纺织丝绸产业技术研究院 (CN) 2019-12-05 WO disclosed
US-4778866-A MONOMER OF FLUORINATED ALKYL ESTERS OF ACRYLIC AND METHACRYLIC ACIDS; DIELECTRIC FOR HIGH VOLTAGE CABLES; TREEING MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1988-10-18 US disclosed
EP-0209299-A1 Copolymers of ethylene and unsaturated ester MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1987-01-21 EP disclosed