SCHEMBL1068580

SCHEMBL1068580

CC(C)(C)CC(O)C(=O)O.CC(C)(CO)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
OR51E2 Q9H255 1/20 0.39
ACACB O00763 1/20 0.36
ACACA Q13085 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.33
GPR84 Q9NQS5 3/20 0.31
FFAR1 O14842 1/20 0.31
TET2 Q6N021 3/20 0.31
KDM4A O75164 2/20 0.31
KDM4C Q9H3R0 2/20 0.31
KDM2A Q9Y2K7 2/20 0.31
TET3 O43151 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1953735 0.85 OR51E2 (0.46) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL1621576 0.85 OR51E2 (0.46) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL1623666 0.85 OR51E2 (0.46) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL29450633 0.83 OR51E2 (0.43) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL30138110 0.83 OR51E2 (0.43) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL19436359 0.83 OR51E2 (0.43) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL28657075 0.83 OR51E2 (0.43) OR51E2SMN1; SMN2GPR84FFAR1TET2
SCHEMBL28815523 0.82 ACACB (0.37) ACACBACACA
SCHEMBL28165943 0.82 ACACB (0.41) OR51E2ACACBACACA
Benzene SCHEMBL28220562 0.81 OR51E2 (0.42) OR51E2SMN1; SMN2GPR84FFAR1TET2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113777881-A Solder resist resin composition, solder resist structure, dry film, and printed wiring board 韩国太阳油墨有限公司 2021-12-10 CN disclosed
EP-2298958-A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film Konica Minolta Holdings, Inc. (JP) 2011-03-23 EP disclosed
EP-2278047-A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film Konica Minolta Holdings, Inc. (JP) 2011-01-26 EP disclosed
US-20090267489-A1 GAS BARRIER THIN FILM LAMINATE, GAS BARRIER RESIN SUBSTRATE AND ORGANIC EL DEVICE KONICA MINOLTA HOLDINGS, INC. (JP) 2009-10-29 US disclosed
US-20090252893-A1 Plasma discharge treatment apparatus, and method of manufacturing gas barrier film KONICA MINOLTA, HOLDINGS, INC. (JP) 2009-10-08 US disclosed
EP-1921180-A1 PLASMA DISCHARGE PROCESSING DEVICE AND PRODUCTION METHOD OF GAS BARRIER FILM KONICA MINOLTA HOLDINGS, INC. (JP) 2008-05-14 EP disclosed