SCHEMBL1071600

SCHEMBL1071600

CC=CC=C(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12337475 1.00
SCHEMBL2362118 1.00
SCHEMBL19152232 0.90 PTGS1 (0.58)
SCHEMBL14953172 0.90 PTGS1 (0.58)
SCHEMBL14953173 0.90 PTGS1 (0.58)
SCHEMBL346616 0.85 PTGS1 (0.71)
SCHEMBL28176299 0.82 PTGS1 (0.68)
SCHEMBL13653760 0.80
SCHEMBL8306118 0.80
SCHEMBL26043843 0.79 PTGS1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116161647-B Preparation method of sorbic acid carbon quantum dots 云南师范大学 2024-05-14 CN claimed
CN-116161647-A Preparation method of sorbic acid carbon quantum dots 云南师范大学 2023-05-26 CN claimed
EP-3508541-B1 TWO-COMPONENT ADHESIVE COMPOSITION LG CHEMICAL LTD (KR) 2021-07-14 EP claimed
CN-104592019-B The method for preparing (E) -2- isopropyl -5- methyl -2,4- hexadienyl acetic acid esters 信越化学工业株式会社 2019-01-25 CN claimed
US-8395146-B2 Composition and organic insulating film prepared using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-03-12 US claimed
US-20110204350-A1 Composition and organic insulating film prepared using the same HAHN JUNG SEOK 2011-08-25 US claimed
US-20080111128-A1 Composition and organic insulating film prepared using the same SAMSUNG ELECTRONICS CO., LTD. 2008-05-15 US claimed
EP-1124874-A1 DISPERSANT BASF AKTIENGESELLSCHAFT (DE) 2001-08-22 EP claimed
WO-2000017250-A1 DISPERSANT BASF AKTIENGESELLSCHAFT (DE) 2000-03-30 WO claimed
EP-0944659-A1 METHOD FOR PRODUCING LINEAR BLOCK COPOLYMERS BASF AKTIENGESELLSCHAFT (DE) 1999-09-29 EP claimed
WO-1998027127-A1 METHOD FOR PRODUCING LINEAR BLOCK COPOLYMERS BASF AKTIENGESELLSCHAFT (DE) 1998-06-25 WO claimed
CN-122036492-A Process for the production of levulinic acid and derivatives thereof 安特卫普大学 2026-05-15 CN disclosed
CN-116161647-B Preparation method of sorbic acid carbon quantum dots 云南师范大学 2024-05-14 CN disclosed
CN-116161647-B Preparation method of sorbic acid carbon quantum dots 云南师范大学 2024-05-14 CN disclosed
CN-116161647-B Preparation method of sorbic acid carbon quantum dots 云南师范大学 2024-05-14 CN disclosed
US-5391445-A FLUORINE AND/OR SILICON-CONTAINING POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1995-02-21 US disclosed
EP-0534479-A1 Electrophotographic material for color proofing Fuji Photo Film Co., Ltd. (JP) 1993-03-31 EP disclosed
US-4952634-A Curable carboxylated polymers containing polymeric polyvalent metal salt crosslinking agents SYNTHETIC PRODUCTS COMPANY (US) 1990-08-28 US disclosed
US-4544690-A COATINGS FOR ASPHALT PAVEMENT REICHHOLD CHEMICALS, INCORPORATED (US) 1985-10-01 US disclosed
US-3976723-A CURED BY CONDENSING WITH A POLYVALENT METAL OXIDE ROHM AND HAAS COMPANY (US) 1976-08-24 US disclosed