Oleic Acid

Oleic Acid

SCHEMBL107189

CCCCCCCC/C=C\CCCCCCCC(=O)O.C[N+](C)(C)C

nearest known ligand 0.89

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 5/20 0.89
PPARD Q03181 5/20 0.89
PPARA Q07869 5/20 0.89
F7 P08709 5/20 0.89
F3 P13726 5/20 0.89
TERT O14746 3/20 0.89
PTPN1 P18031 3/20 0.89
HSD17B10 Q99714 3/20 0.89
FABP4 P15090 3/20 0.89
TOP1 P11387 3/20 0.89
MAPT P10636 2/20 0.89
BLM P54132 2/20 0.89
LMNA P02545 2/20 0.89
ALOX15 P16050 2/20 0.89
DUSP3 P51452 2/20 0.89
CYP19A1 P11511 2/20 0.89
PTGS1 P23219 2/20 0.89
NR4A2 P43354 2/20 0.89
SIRT6 Q8N6T7 2/20 0.89
PTPN7 P35236 2/20 0.89

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Erucic Acid SCHEMBL27346662 0.96 PPARG (0.96) PPARGPPARDPPARAF7F3
Linoleic Acid SCHEMBL105002 0.95 PPARG (0.90) PPARGPPARDPPARAF7F3
SCHEMBL22608057 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
Oleic Acid SCHEMBL20975500 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
SCHEMBL22608052 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
Vaccenic Acid SCHEMBL25298899 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
Palmitoleic Acid SCHEMBL25293293 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
SCHEMBL25424711 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
SCHEMBL20577298 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3
Oleic Acid SCHEMBL25289881 0.94 PPARG (1.00) PPARGPPARDPPARAF7F3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2588145-A1 SYNTHESIS OF HIGH-PERFORMANCE IRON OXIDE PARTICLE TRACERS FOR MAGNETIC PARTICLE IMAGING (MPI) Koninklijke Philips Electronics N.V. (NL) 2013-05-08 EP claimed
US-20130095043-A1 SYNTHESIS OF HIGH-PERFORMANCE IRON OXIDE PARTICLE TRACERS FOR MAGNETIC PARTICLE IMAGING (MPI) KONINKLIJKE PHILIPS ELECTRONICS N.V. (NL) 2013-04-18 US claimed
WO-2012001579-A1 SYNTHESIS OF HIGH-PERFORMANCE IRON OXIDE PARTICLE TRACERS FOR MAGNETIC PARTICLE IMAGING (MPI) KONINKLIJKE PHILIPS ELECTRONICS N.V. (NL) 2012-01-05 WO claimed
US-6997270-B2 Compounds and method for generating a highly efficient membrane in water-based drilling fluids HALLIBURTON ENERGY SERVICES, INC. (US) 2006-02-14 US claimed
US-20040011563-A1 Novel compounds and method for generating a highly efficient membrane in water-based drilling fluids HALLIBURTON ENERGY SERVICES, INC. 2004-01-22 US claimed
EP-1346130-A1 NOVEL COMPOUNDS AND METHOD FOR GENERATING A HIGHLY EFFICIENT MEMBRANE IN WATER-BASED DRILLING FLUIDS Halliburton Energy Services, Inc. (US) 2003-09-24 EP claimed
WO-2002053873-A1 NOVEL COMPOUNDS AND METHOD FOR GENERATING A HIGHLY EFFICIENT MEMBRANE IN WATER-BASED DRILLING FLUIDS HALLIBURTON ENERGY SERVICES, INC. (US) 2002-07-11 WO claimed
CN-119331250-A Silicon-containing bottom anti-reflection coating composition and preparation method and application thereof 福建泓光半导体材料有限公司 2025-01-21 CN disclosed
CN-118444530-A Bottom anti-reflection coating composition, preparation method thereof, and formation method and application of photoresist pattern 安徽恒坤新材料科技有限公司 2024-08-06 CN disclosed
CN-118444529-A Bottom anti-reflection coating composition, preparation method thereof, and formation method and application of photoetching pattern 安徽恒坤新材料科技有限公司 2024-08-06 CN disclosed
WO-2023238500-A1 TREATMENT AGENT FOR CARBON FIBER PRECURSOR, AND CARBON FIBER PRECURSOR 竹本油脂株式会社 2023-12-14 WO disclosed
EP-2426558-B1 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process SHINETSU CHEMICAL CO (JP) 2018-10-24 EP disclosed
EP-2500775-B1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHINETSU CHEMICAL CO (JP) 2018-01-03 EP disclosed
EP-1346130-A1 NOVEL COMPOUNDS AND METHOD FOR GENERATING A HIGHLY EFFICIENT MEMBRANE IN WATER-BASED DRILLING FLUIDS Halliburton Energy Services, Inc. (US) 2003-09-24 EP disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
WO-2002053873-A1 NOVEL COMPOUNDS AND METHOD FOR GENERATING A HIGHLY EFFICIENT MEMBRANE IN WATER-BASED DRILLING FLUIDS HALLIBURTON ENERGY SERVICES, INC. (US) 2002-07-11 WO disclosed
US-6171532-B1 Method of stabilizing sintered foam and of producing open-cell sintered foam parts BASF AKTIENGESELLSCHAFT (DE) 2001-01-09 US disclosed
US-6153547-A INORGANIC POWDER BASF AKTIENGESELLSCHAFT (DE) 2000-11-28 US disclosed
US-5998317-A INTRODUCING A FLOWABLE MIXTURE COMPRISING AN AQUEOUS POLYMER DISPERSION, SINTERABLE INORGANIC POWDER AND DISPERSANT INTO A PRECIPITATION BATH IN WHICH THE POLYMER PRECIPITATES OR COAGULATES; DRYING AND HEATING AND SINTERING BASF AKTIENGESELLSCHAFT (DE) 1999-12-07 US disclosed
US-5976454-A Process for producing open-celled, inorganic sintered foam products BASF AKTIENGESELLSCHAFT (DE) 1999-11-02 US disclosed