⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2322182 | 0.62 | — | — | |
| SCHEMBL1070093 | 0.59 | — | — | |
| SCHEMBL1094671 | 0.59 | — | — | |
| SCHEMBL1072733 | 0.56 | — | — | |
| Methoxymethane SCHEMBL5707121 | 0.53 | — | — | |
| Methoxymethane SCHEMBL16998540 | 0.53 | — | — | |
| Methoxymethane SCHEMBL868 | 0.53 | — | — | |
| Methoxymethane SCHEMBL12190176 | 0.53 | — | — | |
| Methoxymethane SCHEMBL23300783 | 0.47 | — | — | |
| Methoxymethane SCHEMBL7766837 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 274 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12449728-B2 | High quantum efficiency dry resist for low exposure dose of EUV radiation | ENTEGRIS, INC. (US) | 2025-10-21 | — | — | US | claimed |
| EP-4327161-A1 | HIGH QUANTUM EFFICIENCY DRY RESIST FOR LOW EXPOSURE DOSE OF EUV RADIATION | Entegris, Inc. (US) | 2024-02-28 | — | — | EP | claimed |
| US-20220350242-A1 | HIGH QUANTUM EFFICIENCY DRY RESIST FOR LOW EXPOSURE DOSE OF EUV RADIATION | MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT | 2022-11-03 | — | — | US | claimed |
| WO-2022226310-A1 | HIGH QUANTUM EFFICIENCY DRY RESIST FOR LOW EXPOSURE DOSE OF EUV RADIATION | ENTEGRIS, INC. (US) | 2022-10-27 | — | — | WO | claimed |
| CN-114630834-A | Organometallic compounds for depositing high purity tin oxide and dry etching of said tin oxide films and deposition reactors | 海星化学有限公司 | 2022-06-14 | — | — | CN | claimed |
| EP-2271681-B1 | METHODS OF PREPARING A POLYMERIZATION CATALYST | CHEVRON PHILLIPS CHEMICAL CO (US) | 2013-10-23 | — | — | EP | claimed |
| US-8211988-B2 | Methods of preparing a polymerization catalyst | CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) | 2012-07-03 | — | — | US | claimed |
| EP-2271681-A1 | METHODS OF PREPARING A POLYMERIZATION CATALYST | Chevron Phillips Chemical Company LP (US) | 2011-01-12 | — | — | EP | claimed |
| WO-2009134361-A1 | METHODS OF PREPARING A POLYMERIZATION CATALYST | CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) | 2009-11-05 | — | — | WO | claimed |
| US-20090275710-A1 | Methods of preparing a polymerization catalyst | CHEVRON PHILLIPS CHEMICAL COMPANY LP | 2009-11-05 | — | — | US | claimed |
| EP-0922386-B1 | Controlled release compositions | ROHM & HAAS (US) | 2004-02-04 | — | — | EP | claimed |
| US-6133376-A | HIGH PERFORMANCE TIRE TREAD INCLUDES: PREFERRED PERCENTAGE OF LOW MOLECULAR WEIGHT COUPLED COPOLYMER OF AROMARTIC VINYL AND CONJUGATED DIENE, A MIDDLE MOLECULAR WEIGHT UNCOUPLED COPOLYMER AND A HIGH MOLECULAR WEIGHT COPULED COPOLYMER | TAIWAN SYNTHETIC RUBBER CO. (TW) | 2000-10-17 | — | — | US | claimed |
| US-6100415-A | Purified alkoxide and process for purifying crude alkoxide | JAPAN PIONICS CO., LTD. (JP) | 2000-08-08 | — | — | US | claimed |
| US-6090399-A | POROUS MATRIX | ROHM AND HAAS COMPANY (US) | 2000-07-18 | — | — | US | claimed |
| EP-0922386-A2 | Controlled release compositions | ROHM AND HAAS COMPANY (US) | 1999-06-16 | — | — | EP | claimed |
| JP-6017005-A | — | — | None | — | — | JP | disclosed |
| JP-61014214-A | — | — | None | — | — | JP | disclosed |
| EP-0181403-A1 | PROCESS FOR PREPARING INORGANIC FIBERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1986-05-21 | — | — | EP | disclosed |
| JP-S6114214-A | IMPROVED RUBBER-LIKE POLYMER | ASAHI CHEM IND CO LTD | 1986-01-22 | — | — | JP | disclosed |
| JP-S06114214-A | — | — | 0001-01-01 | — | — | JP | disclosed |