⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL491123 | 0.80 | — | — | |
| SCHEMBL5476247 | 0.79 | — | — | |
| SCHEMBL6659745 | 0.78 | — | — | |
| SCHEMBL5915980 | 0.78 | — | — | |
| SCHEMBL9653428 | 0.77 | — | — | |
| SCHEMBL9653171 | 0.77 | — | — | |
| SCHEMBL28599457 | 0.76 | — | — | |
| SCHEMBL483212 | 0.76 | TP53 (0.37) | — | |
| SCHEMBL9653272 | 0.75 | — | — | |
| SCHEMBL8374801 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4223846-A1 | INK SET, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | FUJIFILM Corporation (JP) | 2023-08-09 | — | — | EP | disclosed |
| US-9855742-B2 | Ink composition and recording method | SEIKO EPSON CORPORATION (JP) | 2018-01-02 | — | — | US | disclosed |
| EP-1905608-B2 | Ink jet recording method and ink jet recording device | FUJIFILM CORP (JP) | 2016-11-23 | — | — | EP | disclosed |
| US-20160214379-A1 | INK COMPOSITION AND RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2016-07-28 | — | — | US | disclosed |
| US-9321267-B2 | Ink composition and recording method | SEIKO EPSON CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-20150328893-A1 | INK COMPOSITION AND RECORDING METHOD | SEIKO EPSON CORP (JP) | 2015-11-19 | — | — | US | disclosed |
| US-9120309-B2 | Ink composition and recording method | SEIKO EPSON CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-20140327716-A1 | INK COMPOSITION AND RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2014-11-06 | — | — | US | disclosed |
| US-8820906-B2 | Ink composition and recording method | SEIKO EPSON CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| EP-1955858-B1 | Ink-jet recording method and device | FUJIFILM CORP (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-7153631-B2 | Pattern-forming process using photosensitive resin composition | HITACHI CHEMICAL CO., LTD. (JP) | 2006-12-26 | — | — | US | disclosed |
| US-20050260524-A1 | Planographic printing plate material and preparing process of planographic printing plate | KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) | 2005-11-24 | — | — | US | disclosed |
| EP-1586460-A1 | Planographic printing plate material and preparing process of planographic printing plate | Konica Minolta Medical & Graphic Inc. (JP) | 2005-10-19 | — | — | EP | disclosed |
| EP-1449651-A2 | Polymerizable composition and lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-25 | — | — | EP | disclosed |
| US-20040106066-A1 | Pattern-forming process using photosensitive resin composition | HAGIWARA HIDEO (JP) | 2004-06-03 | — | — | US | disclosed |
| US-6309791-B1 | CONTAINING AROMATIC DIAMINE | HITACHI CHEMICAL CO. (JP) | 2001-10-30 | — | — | US | disclosed |
| EP-1091253-A2 | Plate making process for planographic plate, automatic developing apparatus and recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6071667-A | POLYIMIDE PRECURSOR PHOTORESIST; PROTECTIVE COATINGS, PRINTED CIRCUIT DIELECTRICS | HITACHI CHEMICAL CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0738745-A1 | Polyimide precursor, polyimide and their use | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1996-10-23 | — | — | EP | disclosed |
| EP-0642057-A1 | Photosensitive resin composition | HITACHI CHEMICAL CO., LTD. (JP) | 1995-03-08 | — | — | EP | disclosed |