SCHEMBL107577

SCHEMBL107577

O=C1CC2CCCC2O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13424991 1.00
SCHEMBL12719898 1.00
SCHEMBL20715356 1.00
SCHEMBL1456817 1.00
SCHEMBL10594377 0.95 SMN1; SMN2 (0.39)
SCHEMBL20715361 0.95 SMN1; SMN2 (0.39)
SCHEMBL1457085 0.95 SMN1; SMN2 (0.39)
SCHEMBL11462520 0.93 SMN1; SMN2 (0.37)
SCHEMBL20715352 0.93 SMN1; SMN2 (0.37)
SCHEMBL9813681 0.93 SMN1; SMN2 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1033 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-9048773-A None JP disclosed
EP-4431492-A1 COMPOUND, COMPOSITION, METHOD, AND PRODUCTION METHOD Warrantee Inc. (JP) 2024-09-18 EP disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-12038689-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-16 US disclosed
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20240219831-A1 PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-04 US disclosed
EP-1626971-A1 6-CYCLYLMETHYL- AND 6-ALKYLMETHYL-SUBSTITUTED PYRAZOLOPYRIMIDINES Bayer HealthCare AG (DE) 2006-02-22 EP disclosed
WO-2004099211-A1 6-CYCLYLMETHYL- AND 6-ALKYLMETHYL-SUBSTITUTED PYRAZOLOPYRIMIDINES BAYER HEALTHCARE AG (DE) 2004-11-18 WO disclosed
US-6433004-B1 GLUTAMATE RECEPTOR AGONISTS OR ANTAGONISTS FOR TREATMENT OF NERVOUS SYSTEM, PSYCHOLOGICAL, AND BRAIN DISORDERS; ANTISPASMODIC, ANTIISCHEMIC, AND ANALGESIC AGENTS BAYER AKTIENGESELLSCHAFT (DE) 2002-08-13 US disclosed
EP-1047685-A1 SUBSTITUTED BETA,GAMMA-ANELLATED LACTONES BAYER AG (DE) 2000-11-02 EP disclosed
WO-1999036417-A1 SUBSTITUTED β,η-ANELLATED LACTONES BAYER AKTIENGESELLSCHAFT (DE) 1999-07-22 WO disclosed
JP-H0948773-A PROSTAGLANDIN INTERMEDIATE AND ITS PRODUCTION FUJI YAKUHIN KOGYO KK 1997-02-18 JP disclosed
EP-0219199-B1 METHOD FOR PREPARATION OF LACTONES COULSTON INTERNATIONAL CORPORATION (US) 1991-07-31 EP disclosed
US-4772728-A AND ALDEHYDE ANGUS CHEMICAL COMPANY (US) 1988-09-20 US disclosed
EP-0219199-A1 Method for preparation of lactones COULSTON INTERNATIONAL CORPORATION (US) 1987-04-22 EP disclosed
US-3862178-A PROCESS FOR THE PRODUCTION OF CYCLOPENTENE INTERMEDIATE AND INTERMEDIATES OBTAINED THEREFROM ICI LTD 1975-01-21 US disclosed