SCHEMBL10766361

SCHEMBL10766361

O=S(=O)(O)c1c(Cl)cc2ccccc2c1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 1/20 0.54
▸ CTRB1 P17538 1/20 0.43
▸ MPL P40238 5/20 0.42
▸ CTRC Q99895 2/20 0.42
▸ ALDH1A1 P00352 3/20 0.41
▸ KDM4E B2RXH2 2/20 0.41
▸ MEN1 O00255 2/20 0.41
▸ MAPT P10636 2/20 0.41
▸ HTT P42858 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ PKM P14618 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ LMNA P02545 1/20 0.41
▸ CASP6 P55212 1/20 0.40
▸ CYP1A2 P05177 2/20 0.39
▸ CYP2A6 P11509 1/20 0.39
▸ NQO1 P15559 1/20 0.39
▸ CYP1A1 P04798 1/20 0.38
▸ CYP1B1 Q16678 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29054363 0.86 CYP2D6 (0.53) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL5492758 0.82 CYP2D6 (0.57) CYP2D6CTRB1MPLCTRCHSD17B10
SCHEMBL358296 0.82 CYP2D6 (0.57) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL11022917 0.81 CYP2D6 (0.51) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL547342 0.79 CYP2D6 (0.54) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL11500850 0.79 CYP2D6 (0.54) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL6110525 0.78 CYP2D6 (0.49) CYP2D6CTRB1MPLCTRCALDH1A1
Hydrochloric Acid SCHEMBL27596429 0.77 CYP2D6 (0.59) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL10593663 0.77 CYP2D6 (0.51) CYP2D6CTRB1MPLCTRCALDH1A1
SCHEMBL29054362 0.76 CYP2D6 (0.40) CYP2D6MPLCTRCALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0095171-B1 COMPOSITION FOR CLEANING SURFACE OF SUBSTRATE Daikin Kogyo Co., Ltd. (JP) 1987-09-09 — — EP disclosed
US-4578209-A HALOGENATED HYDROCARBON SOLVENT, FLUORINE CONTAINING ALCOHOL, AND AN ACID DAIKIN KOGYO CO., LTD. (JP) 1986-03-25 — — US disclosed
EP-0095171-A2 Composition for cleaning surface of substrate Daikin Kogyo Co., Ltd. (JP) 1983-11-30 — — EP disclosed
US-4221674-A FOR DISSOLVING OF POLYMERIC SUBSTANCES ALLIED CHEMICAL CORPORATION (US) 1980-09-09 — — US disclosed
US-4215005-A ORGANIC SULFONIC ACID AND A HYDROGEN FLUORIDE COMPLEX WITH A NITROGEN CONTAINING COMPOUND ALLIED CHEMICAL CORPORATION (US) 1980-07-29 — — US disclosed
US-4165295-A PHOTORESISTS, ORGANIC SULFONIC ACIDS, FLUORIDE ION ALLIED CHEMICAL CORPORATION (US) 1979-08-21 — — US disclosed
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