Hypochlorous Acid

Hypochlorous Acid

SCHEMBL10788985

CC(C)CC(NC(=O)C1CCCN1)C(=O)NCC(=O)Oc1c(Cl)c(Cl)c(Cl)c(Cl)c1Cl.OCl

nearest known ligand 0.35

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Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ DPP7 Q9UHL4 1/20 0.35
▸ CAPN9 O14815 1/20 0.35
▸ CYP3A4 P08684 2/20 0.35
▸ CYP2D6 P10635 2/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ TERT O14746 1/20 0.34
▸ MAPK1 P28482 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ PRCP P42785 1/20 0.34
▸ REN P00797 1/20 0.34
▸ HTR2C P28335 2/20 0.33
▸ CTSC P53634 2/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ CAPN1 P07384 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hypochlorous Acid SCHEMBL10788989 1.00 DPP7 (0.35) DPP7CAPN9CYP3A4CYP2D6CYP1A2
SCHEMBL10793526 0.99 DPP7 (0.36) DPP7CAPN9CYP3A4CYP2D6CYP1A2
SCHEMBL10793530 0.99 DPP7 (0.36) DPP7CAPN9CYP3A4CYP2D6CYP1A2
Hydrochloric Acid SCHEMBL10788803 0.98 DPP7 (0.35) DPP7CAPN9CYP3A4CYP2D6CYP1A2
Hydrochloric Acid SCHEMBL10788806 0.98 DPP7 (0.35) DPP7CAPN9CYP3A4CYP2D6CYP1A2
SCHEMBL10792868 0.82 CTSC (0.51) CYP3A4CYP2D6CYP1A2CYP2C19REN
SCHEMBL10791354 0.82 CTSC (0.51) CYP3A4CYP2D6CYP1A2CYP2C19REN
Hydrochloric Acid SCHEMBL10791348 0.81 CTSC (0.50) CYP3A4CYP2D6CYP1A2CYP2C19REN
Hydrochloric Acid SCHEMBL10794177 0.81 CTSC (0.50) CYP3A4CYP2D6CYP1A2CYP2C19REN
SCHEMBL1369569 0.80 DPP7 (0.43) DPP7CAPN9CYP3A4CYP2D6CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0142231-B1 PROCESS FOR PRODUCING SEQUENTIAL POLYAMINO ACID RESIN NITTO BOSEKI CO., LTD. (JP) 1987-11-11 — — EP disclosed
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