⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1931150 | 0.72 | — | — | |
| SCHEMBL555115 | 0.67 | — | — | |
| SCHEMBL203872 | 0.61 | — | — | |
| SCHEMBL6054660 | 0.61 | — | — | |
| SCHEMBL6950295 | 0.58 | — | — | |
| SCHEMBL23749599 | 0.55 | — | — | |
| SCHEMBL8354132 | 0.55 | — | — | |
| SCHEMBL17701120 | 0.50 | — | — | |
| SCHEMBL15048853 | 0.50 | — | — | |
| SCHEMBL11554337 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 185 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12322592-B2 | Deposition of silicon-based dielectric films | APPLIED MATERIALS, INC. (US) | 2025-06-03 | — | — | US | claimed |
| EP-4292122-A1 | DEPOSITION OF SILICON-BASED DIELECTRIC FILMS | Applied Materials, Inc. (US) | 2023-12-20 | — | — | EP | claimed |
| CN-116964714-A | Deposition of silicon-based dielectric films | 应用材料公司 | 2023-10-27 | — | — | CN | claimed |
| CN-110105383-B | Hydrocarbyloxydisilanes | 美国陶氏有机硅公司 | 2023-04-25 | — | — | CN | claimed |
| CN-115928058-A | Vanadate modified silicon-zirconium composite passive film and preparation method thereof | 安徽工业大学 | 2023-04-07 | — | — | CN | claimed |
| CN-110036138-B | Thio (di) silanes | 美国陶氏有机硅公司 | 2023-01-10 | — | — | CN | claimed |
| US-20220270870-A1 | DEPOSITION OF SILICON-BASED DIELECTRIC FILMS | APPLIED MATERIALS, INC. (US) | 2022-08-25 | — | — | US | claimed |
| WO-2022174017-A1 | DEPOSITION OF SILICON-BASED DIELECTRIC FILMS | APPLIED MATERIALS, INC. (US) | 2022-08-18 | — | — | WO | claimed |
| CN-112409256-A | 5, 7-dichlorotetrahydroisoquinoline acetal amine compound, and preparation method and application thereof | 山东福长药业有限公司 | 2021-02-26 | — | — | CN | claimed |
| CN-111793404-A | Graphene water-based anticorrosive paint and use method thereof | 郑州格莱菲高铁新材料科技有限公司 | 2020-10-20 | — | — | CN | claimed |
| CN-103031530-A | Thin film forming method and film forming apparatus | TOKYO ELECTRON LTD | 2013-04-10 | — | — | CN | claimed |
| CN-102137823-A | Composition for reinforcing hollow glass and protecting same from scratching, corresponding treatment methods and resulting treated hollow glass | SAINT GOBAIN EMBALLAGE | 2011-07-27 | — | — | CN | claimed |
| CN-100373559-C | CVD method and device for forming silicon-containing insulation film | TOKYO ELECTRON LTD (JP) | 2008-03-05 | — | — | CN | claimed |
| CN-100344790-C | Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition technology | AIR LIQUIDE (FR) | 2007-10-24 | — | — | CN | claimed |
| US-20060286819-A1 | Method for silicon based dielectric deposition and clean with photoexcitation | APPLIED MATERIALS, INC. | 2006-12-21 | — | — | US | claimed |
| US-20050255714-A1 | Method for silicon nitride chemical vapor deposition | APPLIED MATERIALS, INC. | 2005-11-17 | — | — | US | claimed |
| CN-1692480-A | CVD method and apparatus for forming silicon-containing insulating film | TOKYO ELECTRON LTD (JP) | 2005-11-02 | — | — | CN | claimed |
| CN-1596324-A | Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition techniques | AIR LIQUIDE (FR) | 2005-03-16 | — | — | CN | claimed |
| EP-0232971-A2 | Clear, weather resistant adherent coating | MORTON INTERNATIONAL, INC. (US) | 1987-08-19 | — | — | EP | claimed |
| US-4640868-A | CURABLE REACTION PRODUCT OF ISOCYANURATE POLYISOCYANATE AND AMINO DISILANE | MORTON THIOKOL INC. (US) | 1987-02-03 | — | — | US | claimed |