SCHEMBL108379

SCHEMBL108379

C=COCC(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL8946878 0.97
Di(Hydroxyethyl)Ether SCHEMBL8946912 0.85 TSHR (0.40)
SCHEMBL608712 0.84 TDP1 (0.48)
SCHEMBL14117998 0.82 TDP1 (0.47)
SCHEMBL8940120 0.82 TDP1 (0.47)
SCHEMBL32669045 0.82 TDP1 (0.47)
SCHEMBL8946890 0.82 TDP1 (0.47)
SCHEMBL1155661 0.82 TDP1 (0.47)
SCHEMBL9294552 0.77
SCHEMBL16776 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3058 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260035494-A1 METHOD FOR COLD FLOW REDUCTION OF ELASTOMERS GOODYEAR TIRE & RUBBER (US) 2026-02-05 US claimed
CN-115819198-B Propylene glycol monovinyl ether and synthetic method and application thereof 四川宇砼建材有限公司 2025-01-07 CN claimed
CN-110515270-B Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device 信越化学工业株式会社 2024-07-12 CN claimed
US-11693317-B2 Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US claimed
CN-115819198-A Propylene glycol monovinyl ether and synthesis method and application thereof 河北兆穰新材料有限公司 2023-03-21 CN claimed
WO-2022228846-A1 METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER BASF SE (DE) 2022-11-03 WO claimed
WO-2022117389-A1 METHOD FOR PRODUCING A TERMINAL-FUNCTIONAL POLYMER BASF SE (DE) 2022-06-09 WO claimed
CN-113667050-A Crosslinking monomer, crosslinking polycarboxylate superplasticizer and preparation method 重庆市化工研究院有限公司 2021-11-19 CN claimed
WO-2021212762-A1 THREE-DIMENSIONAL MOLDING MATERIAL, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 珠海赛纳三维科技有限公司 (CN) 2021-10-28 WO claimed
CN-111393567-A Three-dimensional forming material and preparation method and application thereof 珠海赛纳三维科技有限公司 2020-07-10 CN claimed
CN-1200011-C Ultralow surface energy type fluorocarbon resin QINGDAO HONGFENG GROUP BUILDIN (CN) 2005-05-04 CN claimed
CN-1450090-A Benzene free type fluorocarbon resin QINGDAO HONGFENG GROUP BUILDIN (CN) 2003-10-22 CN claimed
CN-1450091-A Ultralow surface energy type fluorocarbon resin QINGDAO HONGFENG GROUP BUILDIN (CN) 2003-10-22 CN claimed
US-6455111-B1 USING UNSATURATED POLYESTER RESIN FORMULATION AS IMPREGNATING, CASTING AND COATING MATERIAL SCHENECTADY INTERNATIONAL, INC. 2002-09-24 US claimed
US-6335468-B1 CONDENSING N-ACYL AMINO ACID OR SALT THEREOF WITH AMINE AND/OR AMMONIA UNDER DEHYDRATING CONDITIONS IN PRESENCE OF BORON COMPOUND AS CATALYST WITH ALCOHOL COEXISTENT AS AUXILIARY SOLVENT AJINOMOTO CO., INC. (JP) 2002-01-01 US claimed
US-5576407-A Copolymers of hydroxyalkyl vinyl ethers for use in detergents and cleaning agents BASF AKTIENGESELLSCHAFT (DE) 1996-11-19 US claimed
US-5514288-A Method of pretreating fabrics to impart soil release properties thereto using polymers of vinyl ethers BASF CORPORATION (US) 1996-05-07 US claimed
US-4900631-A COPOLYMER OF VINYL CHLORIDE, SULFUR, OR PHOSPHORUS CONTAINING COMPOUND AND HYDROXY CONTAINING COMPOUND NIPPON ZEON CO., LTD. (JP) 1990-02-13 US claimed
US-4851465-A VINYL CHLORIDE, SULFUR OR PHOSPHORUS ACID UNSATURATED MONOMER, HYDROXY-CONTAINING UNSATURATED MONOMER, MAGNETIC RECORDING MEDIA NIPPON ZEON CO., LTD. (JP) 1989-07-25 US claimed
US-4690968-A VINYL ESTER, VINYL ETHER, HYDROXY VINY ETHER COMONOMERS; COATINGS AND PAINTS DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-09-01 US claimed