SCHEMBL1088517

SCHEMBL1088517

FOF.[Yb]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL45345 0.89
Magnesium SCHEMBL224831 0.80
SCHEMBL154001 0.80
SCHEMBL10611491 0.80
Charcoal, Activated SCHEMBL3115984 0.80
SCHEMBL23878703 0.80
SCHEMBL1116316 0.80
SCHEMBL544815 0.80
SCHEMBL20952051 0.80
SCHEMBL1954533 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7184203-B2 Rare earth compounds having photo-luminescent properties and applications thereof WORKMAN NYDEGGER PC 2007-02-27 US claimed
WO-2005010120-A2 RARE EARTH COMPOUNDS HAVING PHOTO-LUMINESCENT PROPERTIES AND APPLICATIONS THEREOF BURGENER ROBERT H II (US) 2005-02-03 WO claimed
US-20040196538-A1 Rare earth compounds having photo-luminescent properties and applications thereof WORKMAN NYDEGGER PC 2004-10-07 US claimed
US-20250353757-A1 MATERIAL FOR FILM FORMATION AND METHOD FOR PRODUCING COATING FILM MITSUI MINING & SMELTING CO LTD (JP) 2025-11-20 US disclosed
CN-120865921-A Lanthanide up-conversion heterojunction material and preparation method and application thereof 湖北大学 2025-10-31 CN disclosed
CN-119256111-A Film-forming material and method for producing film 日本钇股份有限公司 2025-01-03 CN disclosed
US-12183551-B2 Gas nozzle, manufacturing method of gas nozzle, and plasma treatment device KYOCERA CORPORATION (JP) 2024-12-31 US disclosed
CN-114639584-B Semiconductor component, plasma processing apparatus and method for forming composite coating 中微半导体设备(上海)股份有限公司 2024-12-06 CN disclosed
EP-3639069-B1 EXTENDING THE REFLECTION BANDWIDTH OF SILVER COATING STACKS FOR HIGHLY REFLECTIVE MIRRORS CORNING INC (US) 2024-10-23 EP disclosed
CN-118510736-A Material for sintered body and sintered body 日本钇股份有限公司 2024-08-16 CN disclosed
WO-2024053257-A1 MATERIAL FOR FILM FORMATION AND METHOD FOR PRODUCING COATING FILM 日本イットリウム株式会社 2024-03-14 WO disclosed
WO-2008010498-A1 PHOSPHOR, METHOD FOR PRODUCTION THEREOF, AND LIGHT-EMITTING APPARATUS SHOWA DENKO K.K. (JP) 2008-01-24 WO disclosed
US-7184203-B2 Rare earth compounds having photo-luminescent properties and applications thereof WORKMAN NYDEGGER PC 2007-02-27 US disclosed
EP-1459132-B1 MULTIPHOTON PHOTOSENSITIZATION SYSTEM 3M INNOVATIVE PROPERTIES CO (US) 2006-06-07 EP disclosed
WO-2005010120-A2 RARE EARTH COMPOUNDS HAVING PHOTO-LUMINESCENT PROPERTIES AND APPLICATIONS THEREOF BURGENER ROBERT H II (US) 2005-02-03 WO disclosed
US-20040196538-A1 Rare earth compounds having photo-luminescent properties and applications thereof WORKMAN NYDEGGER PC 2004-10-07 US disclosed
EP-1459132-A1 MULTIPHOTON PHOTOSENSITIZATION SYSTEM 3M Innovative Properties Company (US) 2004-09-22 EP disclosed
US-6750266-B2 PHOTOINITIATORS 3M INNOVATIVE PROPERTIES COMPANY 2004-06-15 US disclosed
US-20030139484-A1 Multiphoton photosensitization system 3M INNOVATIVE PROPERTIES COMPANY 2003-07-24 US disclosed
WO-2003058346-A1 MULTIPHOTON PHOTOSENSITIZATION SYSTEM 3M INNOVATIVE PROPERTIES COMPANY (US) 2003-07-17 WO disclosed