SCHEMBL108892

SCHEMBL108892

CCO[Al](OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15063009 0.96
SCHEMBL5729396 0.96
SCHEMBL509640 0.96
SCHEMBL384218 0.96
Lithium Ion SCHEMBL384217 0.92
SCHEMBL15016076 0.92
SCHEMBL509639 0.92
Hydrochloric Acid SCHEMBL8853911 0.92
SCHEMBL11270758 0.89
SCHEMBL8736018 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1500 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122025872-A Lithium oxalate composite lithium supplementing agent, and preparation method and application thereof 北京当升材料科技股份有限公司 2026-05-12 CN claimed
US-12577215-B2 Triazine UV absorbers and a process for the preparation thereof BASF SE (DE) 2026-03-17 US claimed
CN-120865674-B Method for preparing self-supporting light material and application 合肥汇智新材料科技有限公司 2026-02-27 CN claimed
EP-4691632-A1 CATALYST FOR METHANE REFORMING AND MANUFACTURING METHOD THEREOF Hanwha Solutions Corporation (KR) 2026-02-11 EP claimed
US-20260022452-A1 METHOD AND SYSTEM FOR DEPOSITING A METAL-CONTAINING LAYER ASM IP HOLDING BV (NL) 2026-01-22 US claimed
US-12494362-B2 Atomic layer deposition of aluminum oxide films for semiconductor devices using an aluminum alkoxide oxidizer TOKYO ELECTRON LIMITED (JP) 2025-12-09 US claimed
US-20250263833-A1 METHOD AND SYSTEM FOR DEPOSITING A METAL-CONTAINING LAYER ASM IP HOLDING B.V. (NL) 2025-08-21 US claimed
US-12378205-B2 Process for the preparation of triazine intermediates and a process for the preparation of UV absorbers thereof BASF SE (DE) 2025-08-05 US claimed
US-12291509-B2 Process for the preparation of UV absorbers BASF SE (DE) 2025-05-06 US claimed
US-20250112345-A1 PROTECTION METHOD AND DEVICE FOR BATTERY COMPONENTS, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRICAL APPARATUS CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED (CN) 2025-04-03 US claimed
US-6090399-A POROUS MATRIX ROHM AND HAAS COMPANY (US) 2000-07-18 US claimed
EP-0922386-A2 Controlled release compositions ROHM AND HAAS COMPANY (US) 1999-06-16 EP claimed
EP-0474391-B1 Polyolefins NIPPON OIL CO LTD (JP) 1995-10-25 EP claimed
EP-0590542-A2 Adhesion promoter for photocurable organosiloxane compositions Dow Corning Toray Silicone Co., Ltd. (JP) 1994-04-06 EP claimed
EP-0474391-A2 Polyolefins NIPPON OIL CO. LTD. (JP) 1992-03-11 EP claimed
EP-0283176-B1 PROCESS FOR PRODUCING ALUMINA- BASED FIBER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-12-18 EP claimed
US-4618507-A Method of making a capacitor winding WESTINGHOUSE ELECTRIC CORP. (US) 1986-10-21 US claimed
US-4593142-A Catalyst system containing hydrogen fluoride and a metal alkoxide VISTA CHEMICAL COMPANY (US) 1986-06-03 US claimed
EP-0076102-B1 PHOTOPOLYMERIZABLE COMPOSITION BASED ON EPOXY COMPOUND KABUSHIKI KAISHA TOSHIBA (JP) 1985-03-20 EP claimed
US-4292345-A Method of protecting carbon-containing component parts of metallurgical units from oxidation KOLESNIK MIKHAIL I 1981-09-29 US claimed