SCHEMBL1089210

SCHEMBL1089210

O=C(O)C=Cc1ccc(C2CCCC2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.54
NPC1 O15118 2/20 0.54
RAB9A P51151 2/20 0.54
MEN1 O00255 2/20 0.54
POLB P06746 2/20 0.54
BLM P54132 1/20 0.54
GPR35 Q9HC97 1/20 0.54
ESR1 P03372 4/20 0.53
HCAR2 Q8TDS4 2/20 0.53
CA12 O43570 2/20 0.53
AKR1B10 O60218 2/20 0.53
CA1 P00915 2/20 0.53
CA2 P00918 2/20 0.53
CA3 P07451 2/20 0.53
AKR1B1 P15121 2/20 0.53
CA4 P22748 2/20 0.53
CA6 P23280 2/20 0.53
DPP4 P27487 2/20 0.53
CA5A P35218 2/20 0.53
CA7 P43166 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11836678 1.00 KMT2A (0.54) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL11823376 0.98 KMT2A (0.56) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL1088759 0.98 KMT2A (0.56) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL11828873 0.98 KMT2A (0.56) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL1088369 0.98 KMT2A (0.56) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL4002818 0.93 ESR1 (0.57) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL4002821 0.93 ESR1 (0.57) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL1087968 0.91 NPC1 (0.51) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL20649461 0.89 NPC1 (0.49) KMT2ANPC1RAB9AMEN1POLB
SCHEMBL11830264 0.86 SLC18A3 (0.52) KMT2ANPC1RAB9AMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8535872-B2 Thermally cured underlayer for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2013-09-17 US disclosed
US-20120178871-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION DE BINOD B (US) 2012-07-12 US disclosed
US-8153346-B2 Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2012-04-10 US disclosed
US-20080206676-A1 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC 2008-08-28 US disclosed
WO-2008103776-A2 THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-28 WO disclosed
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed
US-3966801-A ANTIINFLAMMATORY AGENTS WILLIAM H. RORER, INC. (US) 1976-06-29 US disclosed