SCHEMBL1089229

SCHEMBL1089229

NC(C1CCCC1)C1CCCC1

nearest known ligand 0.53

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 3/20 0.43
TP53 P04637 1/20 0.39
KDM4E B2RXH2 1/20 0.38
GMNN O75496 1/20 0.38
LMNA P02545 1/20 0.38
MAPT P10636 1/20 0.38
BLM P54132 1/20 0.38
PMP22 Q01453 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
SHBG P04278 1/20 0.36
THRB P10828 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
DPP4 P27487 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22570753 0.96 EPHX1 (0.48) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL44016 0.96 EPHX1 (0.48) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL5200916 0.96 EPHX1 (0.48) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL2139173 0.96 EPHX1 (0.48) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL5200385 0.96 EPHX1 (0.41) EPHX1TP53KDM4EGMNNLMNA
Hydrochloric Acid SCHEMBL2464621 0.93 KDM4E (0.46) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL20721151 0.93 EPHX1 (0.46) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL1356262 0.93 EPHX1 (0.46) EPHX1TP53KDM4EGMNNLMNA
Ammonia Solution, Strong SCHEMBL6904891 0.93 EPHX1 (0.46) EPHX1TP53KDM4EGMNNLMNA
SCHEMBL3054316 0.92 EPHX1 (0.36) EPHX1TP53KDM4EGMNNLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1737823-A2 NOVEL ALKYNE COMPOUNDS WITH AN MCH-ANTAGONISTIC ACTION AND MEDICAMENTS COMPRISING SAID COMPOUNDS Boehringer Ingelheim International GmbH (DE) 2007-01-03 EP claimed
WO-2005103002-A2 NOVEL ALKYNE COMPOUNDS WITH AN MCH-ANTAGONISTIC ACTION AND MEDICAMENTS COMPRISING SAID COMPOUNDS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2005-11-03 WO claimed
EP-4747254-A1 <SUP2/>? <SUB2/>?2B?5-HTSEROTONIN RECEPTOR ANTAGONISTS, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE THEREOF The United States of America, as represented by the Secretary, Department of Health and Human Services (US) 2026-05-27 EP disclosed
WO-2025106697-A1 BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING HUSTAD PHILLIP DENE (US) 2025-05-22 WO disclosed
US-20250068079-A1 BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT HUSTAD PHILLIP DENE (US) 2025-02-27 US disclosed
WO-2025019529-A1 5-HT 2B SEROTONIN RECEPTOR ANTAGONISTS, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE THEREOF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 2025-01-23 WO disclosed
WO-2024107979-A1 BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT HUSTAD PHILLIP DENE (US) 2024-05-23 WO disclosed
EP-2387735-B1 NONPOLYMERIC BINDERS FOR SEMICONDUCTOR SUBSTRATE COATINGS FUJIFILM ELECTRONIC MAT USA INC (US) 2019-03-13 EP disclosed
CN-105408399-B Novel polymers and thermosetting compositions containing same 富士胶片电子材料美国有限公司 2019-01-01 CN disclosed
US-20160280624-A1 TERTIARY ALKYLAMINES AS METHACROLEIN SYNTHESIS CO-CATALYST EVONIK ROEHM GMBH (DE) 2016-09-29 US disclosed
CN-105408399-A Novel polymers and thermosetting compositions containing same FUJIFILM ELECTRONIC MAT USA INC 2016-03-16 CN disclosed
US-7022456-B2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 2006-04-04 US disclosed
US-20040048190-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. 2004-03-11 US disclosed
EP-1201654-B1 Process for preparing allenyl beta-lactam derivatives OTSUKA KAGAKU KK (JP) 2004-02-18 EP disclosed
EP-0759436-B1 PROCESS FOR THE PREPARATION OF BETA-LACTAM DERIVATIVE OTSUKA KAGAKU KK (JP) 2002-07-03 EP disclosed
EP-1201654-A2 Process for preparing allenyl beta-lactam derivatives OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 2002-05-02 EP disclosed
EP-1201669-A2 Process for preparing halogenated cephem derivatives OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 2002-05-02 EP disclosed
US-6150519-A MULTISTAGE PROCESS WITH BASIFICATION AND ION EXCHANGING THEN ISOLATION AN ALLENE COMPOUND OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 2000-11-21 US disclosed
US-5929233-A HALOGENATION OF ALLENYL BETA-LACTAM IN PRESENCE OF SULFINATE ION OR THIOLATE ION CAPTURING AGENT OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 1999-07-27 US disclosed
EP-0759436-A1 PROCESSES FOR THE PREPARATION OF BETA-LACTAM DERIVATIVE OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 1997-02-26 EP disclosed