Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4966393 | 0.83 | CYP19A1 (0.54) | CYP19A1 | |
| SCHEMBL4966164 | 0.83 | CYP19A1 (0.54) | CYP19A1 | |
| SCHEMBL9625158 | 0.78 | CYP19A1 (0.57) | CYP19A1LMNA | |
| SCHEMBL5715344 | 0.77 | CYP19A1 (0.59) | CYP19A1 | |
| SCHEMBL7561100 | 0.77 | CYP19A1 (0.49) | CYP19A1 | |
| SCHEMBL2951880 | 0.77 | CYP19A1 (0.49) | CYP19A1 | |
| SCHEMBL4982703 | 0.75 | CYP19A1 (0.50) | CYP19A1LMNA | |
| SCHEMBL9191167 | 0.74 | — | — | |
| SCHEMBL12964377 | 0.72 | CYP19A1 (0.44) | CYP19A1 | |
| SCHEMBL7511514 | 0.71 | CYP19A1 (0.47) | CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121319065-A | Preparation and application of nickel imide chloride catalyst | 芜湖职业技术学院 | 2026-01-13 | — | — | CN | disclosed |
| CN-107602734-B | A kind of palladium-containing catalyst, preparation method, composition as made from it and application | 东华大学 | 2019-10-18 | — | — | CN | disclosed |
| US-8535872-B2 | Thermally cured underlayer for lithographic application | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2013-09-17 | — | — | US | disclosed |
| US-20120178871-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | DE BINOD B (US) | 2012-07-12 | — | — | US | disclosed |
| US-8153346-B2 | Hydroxyl containing polymer, amino crosslinking agent and thermal acid generator; undercoating for multilayer lithography material | FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) | 2012-04-10 | — | — | US | disclosed |
| US-20080206676-A1 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS, U.S.A, INC | 2008-08-28 | — | — | US | disclosed |
| WO-2008103776-A2 | THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-28 | — | — | WO | disclosed |
| EP-1599511-A2 | A QUASI-LIVING METAL CATALYST FOR ETHYLENE HOMO-POLYMERIZATION AND CO-POLYMERIZATION WITH 5-NORBORNEN-2-YL ACETATE | The Regents of the University of California (US) | 2005-11-30 | — | — | EP | disclosed |
| WO-2004078337-A2 | A QUASI-LIVING METAL CATALYST FOR ETHYLENE HOMO-POLYMERIZATION AND CO-POLYMERIZATION WITH 5-NORBORNEN-2-YL ACETATE | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2004-09-16 | — | — | WO | disclosed |
| EP-0451858-B1 | Molded article of norbornene-based polymer | NIPPON ZEON CO (JP) | 1996-10-09 | — | — | EP | disclosed |
| US-5302656-A | Heat resistance, crack resistance | NIPPON ZEON CO., LTD. (JP) | 1994-04-12 | — | — | US | disclosed |
| EP-0451858-A2 | Molded article of norbornene-based polymer | NIPPON ZEON CO., LTD. (JP) | 1991-10-16 | — | — | EP | disclosed |
| EP-0286839-A1 | Metathesis polymerized copolymer | HERCULES INCORPORATED (US) | 1988-10-19 | — | — | EP | disclosed |