Known targets — ChEMBL curated mechanism
rplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Stearic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP3 | P05413 | 7/20 | 0.67 |
| ▸ | CA1 | P00915 | 1/20 | 0.65 |
| ▸ | CES2 | O00748 | 4/20 | 0.61 |
| ▸ | CES1 | P23141 | 4/20 | 0.61 |
| ▸ | BBOX1 | O75936 | 2/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Decanoic Acid SCHEMBL107062 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Dodecanoate SCHEMBL5153809 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Heptanoate SCHEMBL108336 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Nonanoate SCHEMBL106670 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Heptadecanoic Acid SCHEMBL7549840 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Palmitic Acid SCHEMBL5155811 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Octanoic Acid SCHEMBL108744 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Myristic Acid SCHEMBL5154017 | 1.00 | FABP3 (0.67) | FABP3CA1CES2CES1BBOX1 | |
| Octanoic Acid SCHEMBL28057625 | 0.98 | FABP3 (0.64) | FABP3CA1CES2CES1BBOX1 | |
| Hexanoate SCHEMBL105666 | 0.98 | CA1 (0.68) | FABP3CA1CES2CES1BBOX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0362459-B1 | Polyacrylate polymers utilizing substituted urea retarder | ZEON CHEMICALS USA INC (US) | 1994-08-10 | — | — | EP | claimed |
| US-5081194-A | Quaternary ammonium or phosphonium curing agent | ZEON CHEMICALS U.S.A., INC. (US) | 1992-01-14 | — | — | US | claimed |
| US-5079304-A | Curable | ZEON CHEMICALS U.S.A., INC. (US) | 1992-01-07 | — | — | US | claimed |
| EP-0362459-A1 | Polyacrylate polymers utilizing substituted urea retarder | Zeon Chemicals USA, Inc. (US) | 1990-04-11 | — | — | EP | claimed |
| EP-0309794-A2 | No-post-cure method of curing polyacrylate polymers | Zeon Chemicals USA, Inc. (US) | 1989-04-05 | — | — | EP | claimed |
| CN-119331250-A | Silicon-containing bottom anti-reflection coating composition and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2025-01-21 | — | — | CN | disclosed |
| CN-118444529-A | Bottom anti-reflection coating composition, preparation method thereof, and formation method and application of photoetching pattern | 安徽恒坤新材料科技有限公司 | 2024-08-06 | — | — | CN | disclosed |
| CN-118444530-A | Bottom anti-reflection coating composition, preparation method thereof, and formation method and application of photoresist pattern | 安徽恒坤新材料科技有限公司 | 2024-08-06 | — | — | CN | disclosed |
| US-20240228368-A9 | INORGANIC FINE PARTICLE DISPERSION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-11 | — | — | US | disclosed |
| CN-115745859-B | Method for extracting lutein in marigold particles by adopting ionic liquid one-step method | 西安交通大学 | 2024-05-07 | — | — | CN | disclosed |
| US-20240132398-A1 | INORGANIC FINE PARTICLE DISPERSION | SUMITOMO CHEMICAL CO (JP) | 2024-04-25 | — | — | US | disclosed |
| EP-4316806-A1 | INORGANIC FINE PARTICLE DISPERSION | Sumitomo Chemical Company Limited (JP) | 2024-02-07 | — | — | EP | disclosed |
| EP-0362459-B1 | Polyacrylate polymers utilizing substituted urea retarder | ZEON CHEMICALS USA INC (US) | 1994-08-10 | — | — | EP | disclosed |
| EP-0466290-A1 | Method and generator for producing radioactive Lead-212 | RESEARCH CORPORATION TECHNOLOGIES, INC. (US) | 1992-01-15 | — | — | EP | disclosed |
| US-5081194-A | Quaternary ammonium or phosphonium curing agent | ZEON CHEMICALS U.S.A., INC. (US) | 1992-01-14 | — | — | US | disclosed |
| US-5079304-A | Curable | ZEON CHEMICALS U.S.A., INC. (US) | 1992-01-07 | — | — | US | disclosed |
| US-5038046-A | Thorium decay to gaseous radon intermediate | BIOTECHNETICS (US) | 1991-08-06 | — | — | US | disclosed |
| US-5008345-A | Two-Part Curing System Containing A Metallic Acid Salt And An Ammonium Or Phosphonium Quaternary Salt | ZEON CHEMICAL USA, INC. (US) | 1991-04-16 | — | — | US | disclosed |
| EP-0362459-A1 | Polyacrylate polymers utilizing substituted urea retarder | Zeon Chemicals USA, Inc. (US) | 1990-04-11 | — | — | EP | disclosed |
| EP-0309794-A2 | No-post-cure method of curing polyacrylate polymers | Zeon Chemicals USA, Inc. (US) | 1989-04-05 | — | — | EP | disclosed |