SCHEMBL109272

SCHEMBL109272

CCC1(O)COC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5866504 0.81
SCHEMBL9079166 0.78
SCHEMBL16240694 0.77
SCHEMBL17474265 0.75
SCHEMBL9545118 0.75
SCHEMBL4302421 0.73
SCHEMBL5137958 0.73
SCHEMBL8404992 0.72
SCHEMBL9332382 0.69
SCHEMBL7901575 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 238 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3523376-B1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEMS OR THIOL-ENE CURABLE SYSTEMS AFI LICENSING LLC (US) 2022-04-20 EP claimed
EP-3523376-A1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEMS OR THIOL-ENE CURABLE SYSTEMS AFI Licensing LLC (US) 2019-08-14 EP claimed
US-20190225832-A1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEM OR THIOL-ENE CURABLE SYSTEMS AFI LICENSING LLC 2019-07-25 US claimed
US-20180334589-A1 HARD COATING RESIN COMPOSITION KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2018-11-22 US claimed
WO-2018067634-A1 COATING COMPOSITIONS INCLUDING DIAMOND AND EITHER CATIONIC CURABLE RESIN SYSTEMS OR THIOL-ENE CURABLE SYSTEMS AFI LICENSING LLC (US) 2018-04-12 WO claimed
EP-2850140-B1 RADIATION CURABLE COMPOSITION, AND METHOD FOR PREPARING A HYBRID SOL-GEL LAYER ON A SURFACE OF A SUBSTRATE USING SAID COMPOSITION UNIVERSITÉ DE HAUTE ALSACE (FR) 2016-07-06 EP claimed
US-8945294-B2 Ink composition for inkjet recording, inkjet recording method, and inkjet recorded material RICOH COMPANY, LTD. (JP) 2015-02-03 US claimed
EP-1605005-B1 CURABLE RESIN COMPOSITION KURARAY CO (JP) 2013-12-04 EP claimed
US-20130071637-A1 INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND INKJET RECORDED MATERIAL RICOH COMPANY, LTD. (JP) 2013-03-21 US claimed
US-4189562-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-02-19 US claimed
EP-4665312-A1 PHARMACEUTICAL COMPOSITIONS COMPRISING A PSYCHEDELIC DRUG AND A DENDRITIC NANOCARRIER MYOB GmbH (DE) 2025-12-24 EP disclosed
EP-3645637-B1 INK, INK SET, INK CONTAINER, IMAGE FORMING METHOD, AND IMAGE FORMING APPARATUS RICOH CO LTD (JP) 2025-06-25 EP disclosed
US-12286542-B2 Ink discharging device, method of discharging ink, method of manufacturing ink-discharged matter, white ink, and set RICOH COMPANY, LTD. (JP) 2025-04-29 US disclosed
WO-2025071076-A1 LAMINATE FOR COVER WINDOW 주식회사 동진쎄미켐 2025-04-03 WO disclosed
EP-3686254-B1 INK, METHOD OF MANUFACTURING INK, PRINTING METHOD, AND PRINTING DEVICE RICOH CO LTD (JP) 2025-03-12 EP disclosed
EP-0882106-A1 COATING COMPOSITION COMPRISING A BICYCLO- OR SPIRO-ORTHOESTER-FUNCTIONAL COMPOUND Akzo Nobel N.V. (NL) 1998-12-09 EP disclosed
US-5721020-A CATION-POLYMERIZABLE COMPOUND, COMPOUND HAVING AT LEAST ONE OXETANE RING, CATIONIC INITIATOR AND LUBRICITY-IMPARTING AGENT KANSAI PAINT CO., LTD. (JP) 1998-02-24 US disclosed
WO-1997031073-A1 COATING COMPOSITION COMPRISING A BICYCLO- OR SPIRO-ORTHOESTER-FUNCTIONAL COMPOUND AKZO NOBEL N.V. (NL) 1997-08-28 WO disclosed
US-4187074-A Water-soluble cationic oligourethane resins and the use thereof for the treatment of pelts or leather BAYER AKTIENGESELLSCHAFT (DE) 1980-02-05 US disclosed
US-4106897-A Leather tanning with oligourethanes BAYER AKTIENGESELLSCHAFT (DE) 1978-08-15 US disclosed