SCHEMBL1098809

SCHEMBL1098809

Nc1cccc(Sc2ccc(Sc3cccc(N)c3)cc2)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ANXA2 P07355 1/20 0.55
S100A10 P60903 1/20 0.55
CYP3A4 P08684 2/20 0.55
TSHR P16473 1/20 0.55
MAPK1 P28482 1/20 0.55
CASP1 P29466 1/20 0.52
RECQL P46063 1/20 0.52
HTR2C P28335 2/20 0.44
HTR6 P50406 1/20 0.44
PDE7A Q13946 3/20 0.44
ALDH1A1 P00352 3/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CA14 Q9ULX7 1/20 0.42
MAOA P21397 3/20 0.41
MAOB P27338 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL125476 0.95 CYP3A4 (0.64) ANXA2S100A10CYP3A4TSHRMAPK1
4,4'-Thiodianiline SCHEMBL10715200 0.95 CYP3A4 (0.64) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL29692549 0.95 CYP3A4 (0.64) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL29436321 0.95 CYP3A4 (0.58) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL125522 0.95 CYP3A4 (0.58) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL3036031 0.93 HTR2C (0.52) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL1100943 0.92 CYP3A4 (0.55) ANXA2S100A10CYP3A4TSHRMAPK1
Benzene SCHEMBL28782155 0.92 CYP3A4 (0.55) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL20132404 0.89 ANXA2 (0.47) ANXA2S100A10CYP3A4TSHRMAPK1
SCHEMBL7858671 0.87 ANXA2 (0.44) ANXA2S100A10CYP3A4TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8153260-B2 Composite material ADEKA CORPORATION (JP) 2012-04-10 US disclosed
US-7851121-B2 Photosensitive polyimide composition and polyimide precursor composition CENTRAL GLASS CO., LTD. (JP) 2010-12-14 US disclosed
US-20100112323-A1 COMPOSITE MATERIAL ADEKA CORPORATION (JP) 2010-05-06 US disclosed
US-20090176172-A1 PHOTOSENSITIVE POLYIMIDE COMPOSITION AND POLYIMIDE PRECURSOR COMPOSITION CENTRAL GLASS CO., LTD. (JP) 2009-07-09 US disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed
US-6183934-B1 FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE KABUSHIKI KAISHA TOSHIBA (JP) 2001-02-06 US disclosed
US-6159654-A Negative photosensitive polymer composition of a thermosetting polymer precursor curable by cyclodehydration upon heating KABUSHIKI KAISHA TOSHIBA (JP) 2000-12-12 US disclosed
US-6001517-A A THERMOSETTING POLYMER WHICH CAN BE CURED THROUGH CYCLODEHYDRATION UPON HEATING AND A CURE ACCELERATOR WHICH CAN BE DEACTIVATED OF ITS CURE ACCELERATION PROPERTY BY IRRIDIATION OF LIGHT KABUSHIKI KAISHA TOSHIBA (JP) 1999-12-14 US disclosed
US-5756650-A COMPOSITION COMPRISING POLYAMIC ACID, CURE ACCELERATOR SELECTED FROM GROUP CONSISTING OF NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AMINO ACID COMPOUND, AROMATIC COMPOUND HAVING TWO OR MORE HYDROXYL GROUPS KABUSHIKI KAISHA TOSHIBA (JP) 1998-05-26 US disclosed
US-5578697-A DIELECTRIC POLYMERS FOR ELECTRONICS KABUSHIKI KAISHA TOSHIBA (JP) 1996-11-26 US disclosed