SCHEMBL10991981

SCHEMBL10991981

O=C1c2ccccc2C(=O)c2c(P)cccc21

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA2A P29274 2/20 0.59
MEN1 O00255 5/20 0.57
KMT2A Q03164 5/20 0.57
CDC25B P30305 1/20 0.57
MAPT P10636 8/20 0.53
ALDH1A1 P00352 8/20 0.53
MAPK1 P28482 8/20 0.53
L3MBTL1 Q9Y468 6/20 0.53
SMN1; SMN2 Q16637 6/20 0.53
TDP1 Q9NUW8 4/20 0.53
LMNA P02545 4/20 0.53
EGFR P00533 3/20 0.53
RAB9A P51151 3/20 0.53
PABPC1 P11940 1/20 0.53
NSD2 O96028 1/20 0.53
MAOA P21397 8/20 0.50
ALOX12 P18054 2/20 0.50
KDM4E B2RXH2 2/20 0.50
RECQL P46063 2/20 0.50
CYP3A4 P08684 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9335085 0.82 MEN1 (0.67) ADORA2AMEN1KMT2ACDC25BMAPT
SCHEMBL5010110 0.82 MEN1 (0.67) ADORA2AMEN1KMT2ACDC25BMAPT
SCHEMBL29836726 0.82 MEN1 (0.67) ADORA2AMEN1KMT2ACDC25BMAPT
Hydrochloric Acid SCHEMBL31034903 0.77 ADORA2A (0.55) ADORA2AMEN1KMT2ACDC25BMAPT
SCHEMBL1886170 0.76 ADORA2A (0.59) ADORA2AMEN1KMT2ACDC25BMAPT
SCHEMBL4354118 0.76 ADORA2A (0.59) ADORA2AMEN1KMT2ACDC25BMAPT
SCHEMBL11101446 0.76 ADORA2A (0.59) ADORA2AMEN1KMT2ACDC25BMAPT
Anthraquinone SCHEMBL14943 0.76 MEN1 (1.00) ADORA2AMEN1KMT2ACDC25BMAPT
Anthraquinone SCHEMBL1901249 0.76 MEN1 (1.00) ADORA2AMEN1KMT2ACDC25BMAPT
Anthraquinone SCHEMBL29358690 0.76 MEN1 (1.00) ADORA2AMEN1KMT2ACDC25BMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4617250-A DIAZO RESIN, HIGH MOLECULAR WEIGHT ACID-CONTAINING COMPOUND, AROMATIC SULFONATE, AND ORGANIC DYE FUJI PHOTO FILM CO., LTD. (JP) 1986-10-14 US disclosed