⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1101588 | 0.87 | — | — | |
| SCHEMBL1101150 | 0.87 | — | — | |
| SCHEMBL4129602 | 0.84 | — | — | |
| SCHEMBL1100480 | 0.79 | — | — | |
| SCHEMBL2337116 | 0.78 | — | — | |
| SCHEMBL3508983 | 0.78 | — | — | |
| SCHEMBL855271 | 0.78 | — | — | |
| SCHEMBL4121330 | 0.77 | SLC6A4 (0.31) | — | |
| SCHEMBL7021274 | 0.77 | SLC6A4 (0.31) | — | |
| SCHEMBL898755 | 0.77 | SLC6A4 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8889813-B2 | Mixture comprising sulfonate group-containing compound and method of manufacturing the same, solution composition, polyurethane resin and method of manufacturing the same, and magnetic recording medium | FUJIFILM CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-20130184426-A1 | MIXTURE COMPRISING SULFONATE GROUP-CONTAINING COMPOUND AND METHOD OF MANUFACTURING THE SAME, SOLUTION COMPOSITION, POLYURETHANE RESIN AND METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| US-8415036-B2 | Mixture comprising sulfonate group-containing compound and method of manufacturing the same, solution composition, polyurethane resin and method of manufacturing the same, and magnetic recording medium | FUJIFILM CORPORATION (JP) | 2013-04-09 | — | — | US | disclosed |
| US-8153283-B2 | Magnetic recording medium, method of modifying surface of magnetic powder and magnetic coating material | FUJIFILM CORPORATION (JP) | 2012-04-10 | — | — | US | disclosed |
| US-20100273029-A1 | MIXTURE COMPRISING SULFONATE GROUP-CONTAINING COMPOUND AND METHOD OF MANUFACTURING THE SAME, SOLUTION COMPOSITION, POLYURETHANE RESIN AND METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2010-10-28 | — | — | US | disclosed |
| US-7737304-B2 | Sulfonic acid polyol compound, polyurethane resin, polyurethane resin for magnetic recording medium, and magnetic recording medium | FUJIFILM CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-7737305-B2 | Sulfonic acid polyol compound, polyurethane resin, polyurethane resin for magnetic recording medium, and magnetic recording medium | FUJIFILM CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20090258254-A1 | SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2009-10-15 | — | — | US | disclosed |
| US-20090246560-A1 | MAGNETIC RECORDING MEDIUM, METHOD OF MODIFYING SURFACE OF MAGNETIC POWDER AND MAGNETIC COATING MATERIAL | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090087687-A1 | SULFONIC ACID POLYOL COMPOUND, POLYURETHANE RESIN, POLYURETHANE RESIN FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20060078711-A1 | Magnetic recording medium and magnetic recording and reproducing method using the same | FUJI PHOTO FILM CO., LTD. | 2006-04-13 | — | — | US | disclosed |