SCHEMBL1101110

SCHEMBL1101110

O=S(=O)=C1C=CC=CC1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1722817 0.73
SCHEMBL7671729 0.71
SCHEMBL6315621 0.71
SCHEMBL2353398 0.71
SCHEMBL9350367 0.71
SCHEMBL8506156 0.70
SCHEMBL29705189 0.70
SCHEMBL7740401 0.70
SCHEMBL3627655 0.69
SCHEMBL2401894 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0716135-B1 MARKING COMPOSITION AND LASER MARKING METHOD NIPPON KAYAKU KK (JP) 1999-09-29 EP claimed
EP-0792756-A2 Liquid composition laser marking article and marking process NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1997-09-03 EP claimed
EP-0716135-A1 MARKING COMPOSITION AND LASER MARKING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1996-06-12 EP claimed
US-5399472-A One which does not inhibit development and one that does, low fog density, good image density EASTMAN KODAK COMPANY (US) 1995-03-21 US claimed
JP-62025755-A None JP disclosed
JP-11279141-A None JP disclosed
US-20250382470-A1 Expandable Foam Formulations, Expanded Foam Materials, and Methods of Making and Using the Same CERTAINTEED LLC (US) 2025-12-18 US disclosed
EP-4547729-A1 EXPANDABLE FOAM FORMULATIONS, EXPANDED FOAM MATERIALS, AND METHODS OF MAKING AND USING THE SAME CertainTeed LLC (US) 2025-05-07 EP disclosed
CN-114206840-B 2-Phenoxy-pyrimidine derivatives as herbicidal compounds 先正达农作物保护股份公司 2024-07-05 CN disclosed
WO-2024006470-A1 EXPANDABLE FOAM FORMULATIONS, EXPANDED FOAM MATERIALS, AND METHODS OF MAKING AND USING THE SAME CERTAINTEED LLC (US) 2024-01-04 WO disclosed
CN-112601668-B Thermosensitive recording material and color-developing agent 索理思科技开曼公司 2022-07-29 CN disclosed
CN-107690434-B Fused tricyclic imidazopyrazine derivatives as modulators of TNF activity UCB生物制药私人有限公司 2021-07-30 CN disclosed
EP-0792756-A2 Liquid composition laser marking article and marking process NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1997-09-03 EP disclosed
EP-0716135-A1 MARKING COMPOSITION AND LASER MARKING METHOD NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1996-06-12 EP disclosed
US-5030731-A Substituted benzotriazoles; storage stability; lacquers CIBA-GEIGY CORPORATION (US) 1991-07-09 US disclosed
US-4898811-A STABILITY AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1990-02-06 US disclosed
US-4775707-A BLOCKED BENZOTRIAZOLES CIBA-GEIGY CORPORATION (US) 1988-10-04 US disclosed
JP-S6225755-A SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL KONISHIROKU PHOTO IND CO LTD 1987-02-03 JP disclosed
US-4439431-A O,O-Diethyl O-((4-tertiarybutylsulfonyl)m-tolyl)phosphorothioate and its insecticidal use THE DOW CHEMICAL COMPANY (US) 1984-03-27 US disclosed
US-4115402-A DIURETICS, SALURETICS, URICOSURIC AGENTS MERCK & CO., INC. (US) 1978-09-19 US disclosed