SCHEMBL1104277

SCHEMBL1104277

O=C(O)CCC(=O)OC(O)CO

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGLN1 Q9GZT9 4/20 0.41
LMNA P02545 4/20 0.41
ALKBH5 Q6P6C2 1/20 0.41
SUCNR1 Q9BXA5 1/20 0.41
KDM2A Q9Y2K7 4/20 0.40
KDM6B O15054 2/20 0.40
KDM5C P41229 2/20 0.40
PHF8 Q9UPP1 2/20 0.40
TET2 Q6N021 3/20 0.34
KDM4A O75164 2/20 0.34
KDM4C Q9H3R0 2/20 0.34
TET3 O43151 1/20 0.34
MAPK1 P28482 2/20 0.34
MAPT P10636 1/20 0.34
OR51E2 Q9H255 2/20 0.33
SLC15A2 Q16348 1/20 0.33
SLC13A3 Q8WWT9 1/20 0.33
CAMK2A Q9UQM7 1/20 0.33
TSHR P16473 1/20 0.32
PDE4A P27815 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1271507 0.91 MAPT (0.39) LMNAMAPK1MAPTOR51E2TSHR
SCHEMBL1104254 0.87 TSHR (0.48) LMNAMAPK1MAPTCAMK2ATSHR
Ethylene Glycol SCHEMBL27913984 0.84 FFAR4 (0.45) LMNAMAPK1MAPTCAMK2ATSHR
SCHEMBL60389 0.82 KDM2A (0.44) EGLN1LMNAALKBH5SUCNR1KDM2A
SCHEMBL27676409 0.81 MAPT (0.50) LMNAMAPK1MAPTKDM4E
SCHEMBL8155595 0.80 EGLN1 (0.43) EGLN1LMNAALKBH5SUCNR1KDM2A
SCHEMBL9609254 0.79 KDM2A (0.39) EGLN1LMNAALKBH5SUCNR1KDM2A
SCHEMBL542358 0.79 MAPT (0.53) EGLN1LMNAALKBH5SUCNR1KDM2A
SCHEMBL28679560 0.78 KDM2A (0.38) EGLN1LMNAALKBH5SUCNR1KDM2A
Water SCHEMBL9474377 0.77 MAPT (0.52) EGLN1LMNAALKBH5SUCNR1KDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8573765-B2 Active radiation curable ink composition, ink composition for inkjet recording, printed matter, and method of producing molded article of printed matter FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-8151705-B2 Method of preparing lithographic printing plate FUJIFILM CORPORATION (JP) 2012-04-10 US disclosed
US-8151705-B2 Method of preparing lithographic printing plate FUJIFILM CORPORATION (JP) 2012-04-10 US disclosed
US-20110241264-A1 ACTIVE RADIATION CURABLE INK COMPOSITION, INK COMPOSITION FOR INKJET RECORDING, PRINTED MATTER, AND METHOD OF PRODUCING MOLDED ARTICLE OF PRINTED MATTER FUJIFILM CORPORATION (JP) 2011-10-06 US disclosed
US-20110241264-A1 ACTIVE RADIATION CURABLE INK COMPOSITION, INK COMPOSITION FOR INKJET RECORDING, PRINTED MATTER, AND METHOD OF PRODUCING MOLDED ARTICLE OF PRINTED MATTER FUJIFILM CORPORATION (JP) 2011-10-06 US disclosed
US-20100081771-A1 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100081771-A1 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
EP-2168767-A1 Method of preparing lithographic printing plate Fujifilm Corporation (JP) 2010-03-31 EP disclosed
US-7645565-B2 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2010-01-12 US disclosed
US-7645565-B2 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2010-01-12 US disclosed
US-20090053653-A1 POLYMERIZABLE COMPOSITION AND LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-02-26 US disclosed
US-20090053653-A1 POLYMERIZABLE COMPOSITION AND LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-02-26 US disclosed
US-7491487-B2 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2009-02-17 US disclosed
US-7491487-B2 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2009-02-17 US disclosed