SCHEMBL1104779

SCHEMBL1104779

CSCC1CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13867705 0.97
SCHEMBL14629612 0.82
SCHEMBL7930299 0.80
SCHEMBL14196705 0.77
SCHEMBL20126554 0.73
SCHEMBL1275536 0.71
SCHEMBL1145227 0.71
SCHEMBL3849230 0.71
SCHEMBL23152042 0.70
SCHEMBL18389649 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020197156-A1 COMPOSITION FOR EPISULFIDE-BASED HIGH REFRACTIVE OPTICAL MATERIAL, AND METHOD FOR MANUFACTURING OPTICAL MATERIAL USING SAME 주식회사 케이오씨솔루션 2020-10-01 WO claimed
EP-1378535-B1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2009-11-11 EP claimed
US-7446163-B2 Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-11-04 US claimed
US-20050261467-A1 Polymerization regulator and composition for resin TAMURA MASAKI 2005-11-24 US claimed
EP-1378535-A1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-01-07 EP claimed
CN-1462290-A Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL CO (JP) 2003-12-17 CN claimed
US-20230374191-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-23 US disclosed
US-20230339921-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAID COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-26 US disclosed
CN-116554434-A Diisocyanate composition for optical lenses and method for preparing the same SKC株式会社 2023-08-08 CN disclosed
CN-112920082-B Diisocyanate composition, method for preparing the same, and optical material using the same SKC株式会社 2023-06-23 CN disclosed
CN-112920374-B Diisocyanate composition for optical lenses and method for preparing the same SKC株式会社 2023-05-30 CN disclosed
CN-112920372-B Method for preparing diisocyanate composition and optical lens SKC株式会社 2023-05-12 CN disclosed
CN-112920375-B Method for preparing diisocyanate composition and optical lens SKC株式会社 2023-05-12 CN disclosed
CN-1271121-C Polymerization regulators, and compositions for resin MITSUBISHI GAS CHEMICAL CO (JP) 2006-08-23 CN disclosed
US-20050261467-A1 Polymerization regulator and composition for resin TAMURA MASAKI 2005-11-24 US disclosed
EP-1378535-A1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-01-07 EP disclosed
CN-1462290-A Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL CO (JP) 2003-12-17 CN disclosed
US-20030171533-A1 Polymerization regulators and compositions for resin MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2003-09-11 US disclosed
CN-1426403-A Episulfide compound and process for producing same MITSUBISHI GAS CHEMICAL CO (JP) 2003-06-25 CN disclosed
US-4163832-A Polythioethers formed by anionic ring opening of episulfides EXXON RESEARCH & ENGINEERING CO. (US) 1979-08-07 US disclosed