SCHEMBL11049839

SCHEMBL11049839

CCOC(C)c1ccc2ccccc2c1

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
UGT2B7 P16662 1/20 0.53
AOC3 Q16853 2/20 0.47
CASR P41180 1/20 0.47
CYP2D6 P10635 3/20 0.46
CYP1A2 P05177 2/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
TSHR P16473 1/20 0.46
HIF1A Q16665 1/20 0.46
SLC6A2 P23975 6/20 0.44
SLC6A4 P31645 6/20 0.44
SLC6A3 Q01959 6/20 0.44
KCNH2 Q12809 4/20 0.44
CYP3A4 P08684 2/20 0.43
CYP2A6 P11509 1/20 0.42
ATM Q13315 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11050148 0.86 SLC6A2 (0.56) UGT2B7AOC3CASRCYP2D6CYP1A2
SCHEMBL11765268 0.81 CASR (0.50) UGT2B7AOC3CASRCYP2D6CYP1A2
SCHEMBL11761172 0.81 UGT2B7 (0.49) UGT2B7AOC3CASRCYP2D6CYP1A2
SCHEMBL14814416 0.81 UGT2B7 (0.49) UGT2B7AOC3CASRCYP2D6CYP1A2
SCHEMBL11764603 0.80 CASR (0.47) UGT2B7AOC3CASRCYP2D6CYP1A2
SCHEMBL7055482 0.80 UGT2B7 (0.61) UGT2B7AOC3CYP2D6CYP1A2MEN1
SCHEMBL11672373 0.80 UGT2B7 (0.61) UGT2B7AOC3CYP2D6CYP1A2MEN1
SCHEMBL2956980 0.80 UGT2B7 (0.61) UGT2B7AOC3CYP2D6CYP1A2MEN1
SCHEMBL15345785 0.80 UGT2B7 (0.47) UGT2B7AOC3CYP2D6CYP1A2MEN1
SCHEMBL17288487 0.80 UGT2B7 (0.47) UGT2B7AOC3CASRCYP2D6CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
WO-2011093520-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-08-04 WO disclosed
US-4459186-A Electrochemical oxidation of alkyl aromatic compounds UOP INC. (US) 1984-07-10 US disclosed