SCHEMBL1105074

SCHEMBL1105074

Cc1ccc([SiH3])c(C)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6424735 0.77
SCHEMBL27583892 0.72
SCHEMBL26586373 0.72
SCHEMBL26586317 0.72
SCHEMBL60541 0.71
SCHEMBL1135726 0.71 TDP1 (0.55)
SCHEMBL19744496 0.71 TDP1 (0.55)
SCHEMBL29365203 0.71
SCHEMBL28998328 0.70 CYP3A4 (0.30)
SCHEMBL8117972 0.69 TDP1 (0.52)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108912332-B Method for preparing cage-type silsesquioxane by catalyzing silane oxidation with cesium carbonate 南开大学 2020-09-08 CN claimed
CN-116705595-A Underlayer for photoresist adhesion and dose reduction 朗姆研究公司 2023-09-05 CN disclosed
CN-113574456-B Underlayer for photoresist adhesion and dose reduction 朗姆研究公司 2023-05-26 CN disclosed
CN-114200776-A Underlayer for photoresist adhesion and dose reduction 朗姆研究公司 2022-03-18 CN disclosed
CN-113574456-A Underlayer for photoresist adhesion and dose reduction 朗姆研究公司 2021-10-29 CN disclosed
CN-108912332-B Method for preparing cage-type silsesquioxane by catalyzing silane oxidation with cesium carbonate 南开大学 2020-09-08 CN disclosed
CN-108372308-B Gold nanowire with various close-packed structures in mixed random arrangement and preparation method and application thereof 西安交通大学 2020-06-19 CN disclosed
CN-105385456-B Liquid crystal aligning agent, liquid crystal alignment film and method for producing same, liquid crystal display element, and retardation film and method for producing same JSR株式会社 2020-01-31 CN disclosed
CN-105073808-B The manufacturing method of radial conjugated diene rubber 日本瑞翁株式会社 2018-06-29 CN disclosed
CN-107207632-A The manufacture method of modified conjugated diene rubber 日本瑞翁株式会社 2017-09-26 CN disclosed
US-20160264426-A1 SYNTHESIS METHODS FOR HALOSILANES Air Liquide Advanced Materials, Inc. 2016-09-15 US disclosed
US-20160264426-A1 SYNTHESIS METHODS FOR HALOSILANES Air Liquide Advanced Materials, Inc. 2016-09-15 US disclosed
US-8153836-B2 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-10 US disclosed
US-20080311514-A1 SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKING METHODS, RESIST COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE PROCESSING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-18 US disclosed
EP-0514034-B1 Silane products from reaction of solid silicon monoxide with aromatic halides DOW CORNING (US) 1996-02-28 EP disclosed
EP-0514034-A1 Silane products from reaction of solid silicon monoxide with aromatic halides DOW CORNING CORPORATION (US) 1992-11-19 EP disclosed
US-5120520-A In presence of metal or metal-contianing catalyst DOW CORNING CORPORATION (US) 1992-06-09 US disclosed