SCHEMBL11058635

SCHEMBL11058635

CC=C(O)C(=O)OCCCOc1ccc(C=Cc2ccc3ccccc3n2)cc1OC

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.62
CYSLTR2 Q9NS75 4/20 0.52
CYSLTR1 Q9Y271 4/20 0.52
MAPT P10636 5/20 0.50
LMNA P02545 3/20 0.48
KMT2A Q03164 3/20 0.48
POLB P06746 2/20 0.48
MEN1 O00255 2/20 0.48
ALDH1A1 P00352 4/20 0.48
NPC1 O15118 3/20 0.48
RAB9A P51151 3/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
HPGD P15428 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
KDM4E B2RXH2 2/20 0.45
CYP2C9 P11712 1/20 0.45
NPSR1 Q6W5P4 1/20 0.45
APP P05067 1/20 0.44
NQO2 P16083 1/20 0.44
BCHE P06276 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10897963 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL389103 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL10894139 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL389104 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL29430027 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL10895002 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL10894866 0.80 GLA (0.72) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL8854403 0.79 GLA (0.81) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL30442596 0.78 GLA (1.00) GLACYSLTR2CYSLTR1MAPTLMNA
SCHEMBL29021873 0.78 GLA (1.00) GLACYSLTR2CYSLTR1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4444868-A CONTAINING STYRYL-TYPE NITROGEN-HETEROCYCLE RESIDUE POLYMER AND ACID AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) 1984-04-24 US disclosed