⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20653960 | 0.78 | — | — | |
| SCHEMBL12965078 | 0.75 | — | — | |
| SCHEMBL3253778 | 0.72 | — | — | |
| SCHEMBL5071748 | 0.72 | — | — | |
| SCHEMBL4905647 | 0.69 | — | — | |
| SCHEMBL170891 | 0.69 | — | — | |
| SCHEMBL5406350 | 0.69 | — | — | |
| SCHEMBL18401 | 0.69 | — | — | |
| SCHEMBL17922821 | 0.69 | — | — | |
| SCHEMBL23254 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3351524-B1 | HOMOALLYL HALIDE COMPOSITION AND METHOD FOR STORING HOMOALLYL HALIDE | KURARAY CO (JP) | 2023-07-12 | — | — | EP | claimed |
| CN-108026005-B | Homoallylic halide composition and method for preserving homoallylic halide | 株式会社可乐丽 | 2021-05-11 | — | — | CN | claimed |
| US-10618860-B2 | Homoallyl halide composition and method for storing homoallyl halide | KURARAY CO., LTD (JP) | 2020-04-14 | — | — | US | claimed |
| EP-3351524-B1 | HOMOALLYL HALIDE COMPOSITION AND METHOD FOR STORING HOMOALLYL HALIDE | KURARAY CO (JP) | 2023-07-12 | — | — | EP | disclosed |
| CN-108026005-B | Homoallylic halide composition and method for preserving homoallylic halide | 株式会社可乐丽 | 2021-05-11 | — | — | CN | disclosed |
| US-10651286-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-05-12 | — | — | US | disclosed |
| US-10618860-B2 | Homoallyl halide composition and method for storing homoallyl halide | KURARAY CO., LTD (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20190305109-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-10-03 | — | — | US | disclosed |
| US-10325998-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-18 | — | — | US | disclosed |
| US-10269924-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-23 | — | — | US | disclosed |
| US-20180244593-A1 | HOMOALLYL HALIDE COMPOSITION AND METHOD FOR STORING HOMOALLYL HALIDE | KURARAY CO., LTD. (JP) | 2018-08-30 | — | — | US | disclosed |
| WO-2014089364-A1 | HISTONE DEMETHYLASE INHIBITORS | QUANTICEL PHARMACEUTICALS, INC (US) | 2014-06-12 | — | — | WO | disclosed |
| WO-2013062985-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| WO-2013063182-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-20130108833-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130105996-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130105916-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| WO-2013063179-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-4460514-A | Method for the preparation of poly (carbonyl fluoride) oligomers | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1984-07-17 | — | — | US | disclosed |
| US-4374715-A | Method for the preparation of poly (carbonoyl fluoride) oligomers | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1983-02-22 | — | — | US | disclosed |