⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13189269 | 0.82 | — | — | |
| SCHEMBL15599266 | 0.77 | — | — | |
| SCHEMBL15599241 | 0.77 | TDP1 (0.32) | — | |
| SCHEMBL13971118 | 0.75 | — | — | |
| SCHEMBL19368504 | 0.73 | — | — | |
| SCHEMBL21125753 | 0.72 | — | — | |
| SCHEMBL19122334 | 0.72 | — | — | |
| SCHEMBL24625541 | 0.69 | — | — | |
| SCHEMBL14793270 | 0.69 | — | — | |
| SCHEMBL20808577 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 626 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4252843-A1 | COMPOUND HAVING INHIBITORY ACTION AGAINST EXCESSIVE MITOCHONDRIAL DIVISIONS | Kyushu University, National University Corporation (JP) | 2023-10-04 | — | — | EP | disclosed |
| US-20230233689-A1 | Bifunctional Small Molecules to Target the Selective Degradation of Circulating Proteins | UNIV YALE (US) | 2023-07-27 | — | — | US | disclosed |
| US-20230233689-A1 | Bifunctional Small Molecules to Target the Selective Degradation of Circulating Proteins | UNIV YALE (US) | 2023-07-27 | — | — | US | disclosed |
| US-11530203-B2 | Tetrazole azasydnone | PURDUE RESEARCH FOUNDATION (US) | 2022-12-20 | — | — | US | disclosed |
| WO-2021102221-A1 | DEUTERATED ANALOGS OF AN IDH1 INHIBITOR | AGIOS PHARMACEUTICALS, INC. (US) | 2021-05-27 | — | — | WO | disclosed |
| WO-2021011722-A1 | MOLECULES HAVING CERTAIN PESTICIDAL UTILITIES, AND INTERMEDIATES, COMPOSITIONS, AND PROCESSES RELATED THERETO | DOW AGROSCIENCES LLC (US) | 2021-01-21 | — | — | WO | disclosed |
| WO-2020133403-A1 | SUBSTITUTED PYRIMIDINE ARYL ESTER DERIVATIVE, PREPARATION METHOD THEREFOR, HERBICIDAL COMPOSITION AND APPLICATION THEREOF | 青岛清原化合物有限公司 | 2020-07-02 | — | — | WO | disclosed |
| US-20190204742-A1 | PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-07-04 | — | — | US | disclosed |
| EP-2270076-B1 | RESIN MOLDED PRODUCT AND POLYMER FILM | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-20070031757-A1 | Positive photosensitive composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-02-08 | — | — | US | disclosed |
| US-20070026343-A1 | Chemical amplification-type resist composition and production process thereof | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157208-B2 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |