⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8654670 | 0.79 | — | — | |
| SCHEMBL12198203 | 0.75 | — | — | |
| SCHEMBL1939752 | 0.72 | — | — | |
| SCHEMBL2465790 | 0.67 | — | — | |
| SCHEMBL251075 | 0.63 | — | — | |
| SCHEMBL2788464 | 0.61 | — | — | |
| SCHEMBL18712967 | 0.59 | — | — | |
| SCHEMBL14661401 | 0.58 | — | — | |
| Hydrogen Peroxide SCHEMBL4585128 | 0.58 | — | — | |
| Hydrogen Peroxide SCHEMBL10686299 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230219932-A1 | COMPOUND AND LABELED BIOLOGICAL SUBSTANCE USING THE SAME | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230147962-A1 | FIBROBLAST ACTIVATION PROTEIN LIGANDS FOR TARGETED DELIVERY APPLICATIONS | PHILOCHEM AG (CH) | 2023-05-11 | — | — | US | disclosed |
| EP-3781574-A1 | MACROCYCLIC SPIROETHERS AS MCL-1 INHIBITORS | Ascentage Pharma (Suzhou) Co., Ltd. (CN) | 2021-02-24 | — | — | EP | disclosed |
| WO-2020147802-A1 | MACROCYCLIC SPIROETHERS AS MCL-1 INHIBITORS | ASCENTAGE PHARMA (SUZHOU) CO., LTD. (CN) | 2020-07-23 | — | — | WO | disclosed |
| US-9725477-B2 | Platinum compounds of malonic acid derivative having leaving group containing amino or alkylamino | BEIJING FSWELCOME TECHNOLOGY DEVELOPMENT CO., LTD (CN) | 2017-08-08 | — | — | US | disclosed |
| US-9403746-B2 | Cross-linked polymer electrolyte membranes and crosslinking monomer | NISSAN NORTH AMERICA, INC. (US) | 2016-08-02 | — | — | US | disclosed |
| US-20150368281-A1 | Platinum Compounds Of Malonic Acid Derivative Having Leaving Group Containing Amino Or Alkylamino | BEIJING FSWELCOME TECHNOLOGY DEVELOPMENT CO., LTD (CN) | 2015-12-24 | — | — | US | disclosed |
| US-9128373-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-08 | — | — | US | disclosed |
| US-8415082-B2 | Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-09 | — | — | US | disclosed |
| US-20120258405-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-11 | — | — | US | disclosed |
| US-8153246-B2 | Optical compensatory film, polarizing plate, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2012-04-10 | — | — | US | disclosed |
| US-20110189752-A1 | COMPLEX | OCTAPHARMA AG | 2011-08-04 | — | — | US | disclosed |
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| US-20100273105-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20090273740-A1 | OPTICAL COMPENSATORY FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| US-7361451-B2 | Lithographic printing plate precursor and lithographic printing method using the same | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7262305-B2 | Anisotropic films based on 1,8-naphthoylene-1′,2′-benzimidazole sulfonates and lyotropic liquid crystal systems and methods for making | NITTO DENKO CORPORATION (JP) | 2007-08-28 | — | — | US | disclosed |