SCHEMBL111111

SCHEMBL111111

COC1(C2(OC)CC2)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16653017 0.84
SCHEMBL7739720 0.73
SCHEMBL10405816 0.71
SCHEMBL6676256 0.64
Water SCHEMBL25401298 0.58
SCHEMBL4582272 0.58
SCHEMBL731782 0.58
SCHEMBL3645925 0.58
SCHEMBL3248407 0.58
SCHEMBL23300641 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 200 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027906-A1 COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2024-01-25 US claimed
US-11762289-B2 Composition including quantum dot, manufacturing method quantum dot and color filter SAMSUNG SDI CO., LTD. (KR) 2023-09-19 US claimed
US-10876046-B2 Curable composition including quantum dot, resin layer using the same and display device SAMSUNG SDI CO., LTD. (KR) 2020-12-29 US claimed
US-20200339876-A1 CURABLE COMPOSITION INCLUDING QUANTUM DOT, RESIN LAYER USING THE SAME AND DISPLAY DEVICE INCLUDING THE RESIN LAYER SAMSUNG SDI CO., LTD. (KR) 2020-10-29 US claimed
US-20190129302-A1 COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2019-05-02 US claimed
US-20180284557-A1 ELECTROCHEMICAL MIRROR SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-10-04 US claimed
US-20150160553-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the Same CHEIL INDUSTRIES INC. (KR) 2015-06-11 US claimed
US-8278021-B2 Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-10-02 US claimed
US-20090030103-A1 METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-01-29 US claimed
EP-1159064-B1 METHOD FOR PHOTOLYTICALLY DEPROTECTING IMMOBILIZED NUCLEOSIDE DERIVATIVES, ESPECIALLY IN THE PRODUCTION OF DNA CHIPS NIGU CHEMIE GMBH (DE) 2004-04-28 EP claimed
US-20260133489-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG SDI CO LTD (KR) 2026-05-14 US disclosed
US-20260125596-A1 CURABLE COMPOSITION, CURED LAYER USING THE COMPOSITION AND DISPLAY DEVICE INCLUDING THE CURED LAYER SAMSUNG SDI CO LTD (KR) 2026-05-07 US disclosed
US-12606650-B2 Curable composition, cured film manufactured using composition, color filter including cured film, and display device including color filter SAMSUNG SDI CO., LTD. (KR) 2026-04-21 US disclosed
EP-4216695-B1 DISPLAY PANEL, PRODUCTION METHOD THEREOF, AND DISPLAY DEVICE INCLUDING THE SAME SAMSUNG ELECTRONICS CO LTD (KR) 2026-03-25 EP disclosed
US-12583874-B2 Compound, anti-reflection film comprising same, and display device SAMSUNG SDI CO., LTD. (KR) 2026-03-24 US disclosed
US-4487713-A HEAT TREATMENT WITH TITANIUM, TIN, ANTIMONY OR ZIRCONIUM COMPOUND EXXON RESEARCH & ENGINEERING CO. (US) 1984-12-11 US disclosed
US-4145261-A ELECTROLYTE-LIQUID FOR THE ELECTRODEPOSITION OF ALUMINUM U.S. PHILIPS CORPORATION (US) 1979-03-20 US disclosed
US-4128645-A ANTIINFLAMMATORY, CNS DEPRESSANT E. R. SQUIBB & SONS, INC. (US) 1978-12-05 US disclosed
US-4127657-A ANTIINFLAMMATORY, CNS DEPRESSANT E. R. SQUIBB & SONS, INC. (US) 1978-11-28 US disclosed
US-4070466-A ANTIINFLAMMATORY, CNS DEPRESSANTS E. R. SQUIBB & SONS, INC. (US) 1978-01-24 US disclosed