Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | TTR | P02766 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | CRHBP | P24387 | 2/20 | 0.33 |
| ▸ | CRHR2 | Q13324 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL28234891 | 0.96 | TTR (0.39) | TSHRTTRLMNACRHBPCRHR2 | |
| SCHEMBL31186546 | 0.85 | — | — | |
| SCHEMBL9792991 | 0.85 | TSHR (0.56) | TSHRTTR | |
| Fluoride SCHEMBL27640108 | 0.85 | — | — | |
| SCHEMBL8123592 | 0.85 | TSHR (0.56) | TSHRTTR | |
| SCHEMBL23012 | 0.85 | — | — | |
| SCHEMBL5144293 | 0.85 | — | — | |
| Oxirane SCHEMBL3845526 | 0.85 | — | — | |
| Benzene SCHEMBL88326 | 0.85 | — | — | |
| SCHEMBL3133708 | 0.85 | TSHR (0.56) | TSHRTTR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4192720-A | Electrodeposition process for forming amorphous silicon | EXXON RESEARCH & ENGINEERING CO. (US) | 1980-03-11 | — | — | US | claimed |
| EP-0010415-B1 | METHOD FOR PRODUCING A SEMICONDUCTOR FILM | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1983-01-26 | — | — | EP | disclosed |
| EP-0010415-A1 | Method for producing a semiconductor film | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 1980-04-30 | — | — | EP | disclosed |
| US-4192720-A | Electrodeposition process for forming amorphous silicon | EXXON RESEARCH & ENGINEERING CO. (US) | 1980-03-11 | — | — | US | disclosed |