SCHEMBL11208392

SCHEMBL11208392

Cc1ccc(C2=NN(c3ccccc3)C(c3ccccc3)C2)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 4/20 0.74
ERBB2 P04626 3/20 0.74
ERBB3 P21860 1/20 0.74
KDR P35968 1/20 0.74
PTK2 Q05397 1/20 0.74
CA1 P00915 2/20 0.73
CA2 P00918 2/20 0.73
MEN1 O00255 8/20 0.64
KMT2A Q03164 8/20 0.64
ATM Q13315 4/20 0.64
MAOA P21397 2/20 0.62
MAOB P27338 2/20 0.62
GAA P10253 3/20 0.61
HSP90AA1 P07900 2/20 0.61
L3MBTL1 Q9Y468 2/20 0.60
PTGS2 P35354 1/20 0.58
KDM4E B2RXH2 2/20 0.58
ALDH1A1 P00352 2/20 0.58
GLA P06280 2/20 0.58
HTT P42858 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25138590 0.97 EGFR (0.78) EGFRERBB2ERBB3KDRPTK2
SCHEMBL8171059 0.94 CA1 (0.73) EGFRERBB2ERBB3KDRPTK2
SCHEMBL27760024 0.94 EGFR (0.74) EGFRERBB2ERBB3KDRPTK2
SCHEMBL14338087 0.92 MEN1 (0.69) EGFRERBB2ERBB3KDRPTK2
SCHEMBL27955202 0.90 MEN1 (0.77) EGFRERBB2ERBB3KDRPTK2
SCHEMBL10361833 0.89 MEN1 (0.69) EGFRERBB2ERBB3KDRPTK2
SCHEMBL395608 0.89 MEN1 (0.73) EGFRERBB2CA1CA2MEN1
SCHEMBL23052404 0.89 MEN1 (0.73) EGFRERBB2CA1CA2MEN1
SCHEMBL11205361 0.88 EGFR (0.74) EGFRERBB2ERBB3KDRPTK2
SCHEMBL11210797 0.88 EGFR (0.74) EGFRERBB2ERBB3KDRPTK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP claimed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US claimed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP claimed
CN-119698496-A Electrochemical synthesis of pyrazolines and pyrazoles 拜耳公司 2025-03-25 CN disclosed
EP-0026088-B1 PHOTORESIST COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-11-23 EP disclosed
US-4349619-A CONTAINING ANTIHALATION AGENTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1982-09-14 US disclosed
EP-0026088-A2 Photoresist compositions JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1981-04-01 EP disclosed