SCHEMBL11217811

SCHEMBL11217811

CN(CN)CCCCCCN(C)CCC(=O)O

nearest known ligand 0.51

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
KDM4C Q9H3R0 19/20 0.51
KDM4A O75164 11/20 0.51
KDM5A P29375 9/20 0.51
PHF8 Q9UPP1 3/20 0.51
KDM5C P41229 1/20 0.49
KDM5B Q9UGL1 1/20 0.49
CHRM2 P08172 1/20 0.46
KDM7A Q6ZMT4 1/20 0.44
KDM2A Q9Y2K7 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26157798 0.86 CHRM2 (0.60) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL11439889 0.83 KMT2A (0.52) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL30635841 0.83 KDM4C (0.55) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL22815162 0.83 KDM4C (0.55) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL5984578 0.82 KDM4C (0.72) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL29380393 0.82 KDM4C (0.72) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL11587594 0.82 KDM4C (0.72) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL8341418 0.82 KDM4C (0.72) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL28434194 0.82 KDM4C (0.72) KDM4CKDM4AKDM5APHF8KDM5C
SCHEMBL8359768 0.82 KDM4C (0.72) KDM4CKDM4AKDM5APHF8KDM5C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4405705-A HYDROPHILIC TOYO BOSEKI KABUSHIKI KAISHA T/A TOYOBA CO., LTD. (JP) 1983-09-20 US disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 US disclosed
US-4188221-A REACTION PRODUCT OF (METH)ACRYLIC ACID AND A POLYGLYCIDYL ETHER OF A POLYOL, MOISTURE RESISTANCE TOYO BOSEKI KABUSHIKI KAISHA (JP) 1980-02-12 US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 US disclosed