⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1889749 | 0.65 | — | — | |
| SCHEMBL28369351 | 0.62 | — | — | |
| SCHEMBL555067 | 0.62 | — | — | |
| SCHEMBL29558400 | 0.62 | — | — | |
| SCHEMBL16588378 | 0.57 | — | — | |
| SCHEMBL7088105 | 0.57 | — | — | |
| Ethane SCHEMBL21591806 | 0.57 | — | — | |
| Ethylene SCHEMBL29176429 | 0.57 | — | — | |
| SCHEMBL9511433 | 0.57 | — | — | |
| SCHEMBL10301289 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115141346-A | Detachable temporary bonding water-based polyurethane dispersion and preparation method thereof | 南通高盟新材料有限公司 | 2022-10-04 | — | — | CN | claimed |
| EP-4731693-A1 | POLYISOCYANATE COMPOSITION | Covestro Deutschland AG (DE) | 2026-04-29 | — | — | EP | disclosed |
| WO-2024260965-A1 | POLYISOCYANATE COMPOSITION | COVESTRO DEUTSCHLAND AG (DE) | 2024-12-26 | — | — | WO | disclosed |
| EP-4480979-A1 | POLYISOCYANATE COMPOSITION | Covestro Deutschland AG (DE) | 2024-12-25 | — | — | EP | disclosed |
| US-11820072-B2 | Dual cure resins for additive manufacturing | CARBON, INC. (US) | 2023-11-21 | — | — | US | disclosed |
| US-11802175-B2 | Epoxy resin modified with polyurethane in low concentration, production method therefor, epoxy resin composition, and cured object | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11702502-B2 | Epoxy resin composition and cured product | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-20230182376-A1 | ONE PART, CATALYST CONTAINING, MOISTURE CURABLE DUAL CURE RESINS FOR ADDITIVE MANUFACTURING | CARBON INC (US) | 2023-06-15 | — | — | US | disclosed |
| US-20230086342-A1 | USE OF SPECIFIC OPEN-CHAIN ETHER ISOCYANATES | COVESTRO DEUTSCHLAND AG (DE) | 2023-03-23 | — | — | US | disclosed |
| EP-4118161-A1 | USE OF SPECIFIC OPEN-CHAIN ETHER ISOCYANATES | Covestro Deutschland AG (DE) | 2023-01-18 | — | — | EP | disclosed |
| US-20170198085-A1 | POLYURETHANE-MODIFIED EPOXY RESIN, METHOD FOR PRODUCING SAME, EPOXY RESIN COMPOSITION AND CURED PRODUCT | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2017-07-13 | — | — | US | disclosed |
| US-9316765-B2 | Photochromic composition | TOKUYAMA CORPORATION (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140340727-A1 | Photochromic Composition | TOKUYAMA CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| EP-1428793-B1 | Soluble carbon nanotubes | SONY DEUTSCHLAND GMBH (DE) | 2011-02-09 | — | — | EP | disclosed |
| US-7854914-B2 | Soluble carbon nanotubes | SONY DEUTSCHLAND GMBH (DE) | 2010-12-21 | — | — | US | disclosed |
| US-20090178559-A1 | SOLUBLE CARBON NANOTUBES | SONY DEUTSCHLAND GMBH (DE) | 2009-07-16 | — | — | US | disclosed |
| US-7531157-B2 | Soluble carbon nanotubes | SONY DEUTSCHLAND GMBH (DE) | 2009-05-12 | — | — | US | disclosed |
| US-20060014375-A1 | Soluble carbon nanotubes | SONY DEUTSCHLAND GMBH (DE) | 2006-01-19 | — | — | US | disclosed |
| WO-2004052783-A2 | SOLUBLE CARBON NANOTUBES | SONY INTERNATIONAL (EUROPE) GMBH (DE) | 2004-06-24 | — | — | WO | disclosed |
| EP-1428793-A1 | Soluble carbon nanotubes | Sony International (Europe) GmbH (DE) | 2004-06-16 | — | — | EP | disclosed |