SCHEMBL11225839

SCHEMBL11225839

[La+3].[O-2].[O-2].[O-2].[Tb+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3918028 0.87
SCHEMBL7648855 0.82
SCHEMBL7543167 0.82
SCHEMBL31207125 0.82
SCHEMBL7544100 0.82
SCHEMBL9699231 0.82
SCHEMBL3200976 0.82
SCHEMBL36463 0.82
SCHEMBL11676053 0.82
SCHEMBL48242 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025264619-A1 FLUORINE PLASMA RESISTANT DIELECTRIC COMPOSITIONS APPLIED MATERIALS, INC. (US) 2025-12-26 WO disclosed
WO-2025264576-A1 DIELECTRIC BOND LAYER FOR JOINING OF DISSIMILAR CERAMIC SEGMENTS OF A SUBSTRATE SUPPORT APPLIED MATERIALS, INC. (US) 2025-12-26 WO disclosed
US-20250391691-A1 DIELECTRIC BOND LAYER FOR JOINING OF DISSIMILAR CERAMIC SEGMENTS OF A SUBSTRATE SUPPORT APPLIED MATERIALS INC (US) 2025-12-25 US disclosed
US-20250387772-A1 FLUORINE PLASMA RESISTANT DIELECTRIC COMPOSITIONS APPLIED MATERIALS INC (US) 2025-12-25 US disclosed
US-4310507-A Contrast agent for radiography EASTMAN KODAK COMPANY (US) 1982-01-12 US disclosed