SCHEMBL1122817

SCHEMBL1122817

OCCOCCOC=COC=COCCOCCO

nearest known ligand 0.55

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
TSHR P16473 2/20 0.50
MAPK1 P28482 1/20 0.50
THRB P10828 1/20 0.38
HTT P42858 1/20 0.38
MAPT P10636 1/20 0.38
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6734896 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL1630024 0.84 TSHR (0.37) MEN1KMT2ATSHRMAPK1ALDH1A1
Ethylene Glycol SCHEMBL27419724 0.81 TSHR (0.35) MEN1KMT2ATSHRMAPK1
SCHEMBL1155428 0.78 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL9843177 0.78 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL1155640 0.78 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL5974292 0.78 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Tetraethylene Glycol SCHEMBL5612538 0.75 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL21933071 0.74 TSHR (0.44) MEN1KMT2ATSHRMAPK1ALDH1A1
SCHEMBL3359595 0.74 MEN1 (1.00) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250215256-A1 POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD NISSAN CHEMICAL CORPORATION (JP) 2025-07-03 US disclosed
US-20250194619-A1 PLANT FRESHNESS KEEPING COMPOSITION, PLATE-SHAPED BODY, STACK, LABEL, AND PACKAGING MATERIAL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-06-19 US disclosed
EP-4503100-A1 POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD Nissan Chemical Corporation (JP) 2025-02-05 EP disclosed
EP-3395842-B1 PROCESS FOR PRODUCING VINYL ETHER POLYMER HAVING HYDROXY GROUPS IN SIDE CHAINS, AND TEMPERATURE-RESPONSIVE POLYMER MIXTURE MARUZEN PETROCHEM CO LTD (JP) 2021-10-06 EP disclosed
US-10711079-B2 Method for producing vinyl ether polymer having hydroxyl group on side chain and temperature-responsive polymer mixture MARUZEN PETROCHEMICAL CO., LTD. (JP) 2020-07-14 US disclosed
US-20180371127-A1 METHOD FOR PRODUCING VINYL ETHER POLYMER HAVING HYDROXYL GROUP ON SIDE CHAIN AND TEMPERATURE-RESPONSIVE POLYMER MIXTURE MARUZEN PETROCHEMICAL CO., LTD. (JP) 2018-12-27 US disclosed
EP-3395842-A1 PROCESS FOR PRODUCING VINYL ETHER POLYMER HAVING HYDROXY GROUPS IN SIDE CHAINS, AND TEMPERATURE-RESPONSIVE POLYMER MIXTURE Maruzen Petrochemical Co., Ltd. (JP) 2018-10-31 EP disclosed
US-8802341-B2 Carbon based black toners prepared via limited coalescence process EASTMAN KODAK COMPANY (US) 2014-08-12 US disclosed
US-20130337375-A1 CARBON BASED BLACK TONERS PREPARED VIA LIMITED COALESCENCE PROCESS BANK OF AMERICA, N.A., AS AGENT 2013-12-19 US disclosed
EP-1413453-B1 Imaged recording materials having a transparent overcoat composition EASTMAN KODAK CO (US) 2013-11-20 EP disclosed
WO-2006052706-A1 INK JET INK COMPOSITION EASTMAN KODAK COMPANY (US) 2006-05-18 WO disclosed
WO-2006052973-A1 INKJET COMPOSITION CONTAINING MICROGEL PARTICLES EASTMAN KODAK COMPANY (US) 2006-05-18 WO disclosed
US-20060100306-A1 Ink jet ink composition EASTMAN KODAK COMPANY 2006-05-11 US disclosed
US-20060100307-A1 Ink jet composition containing microgel particles EASTMAN KODAK COMPANY 2006-05-11 US disclosed
CN-1200139-C Method for preventing corrosion of metal surfaces HENKEL KG (DE) 2005-05-04 CN disclosed
US-20040202838-A1 Overcoat composition for image recording materials EASTMAN KODAK COMPANY 2004-10-14 US disclosed
US-20040097615-A1 Ink composition for ink jet printing EASTMAN KODAK COMPANY 2004-05-20 US disclosed
EP-1413453-A2 Imaged recording materials having a transparent overcoat composition EASTMAN KODAK COMPANY (US) 2004-04-28 EP disclosed
US-20020143120-A1 Composition of vinyl ether group-containing (meth) acrylic acid ester and production method thereof NIPPON SHOKUBAI CO., LTD. 2002-10-03 US disclosed
US-4426438-A Anionic copolymers containing polyvalent metal cations and their use in photographic materials AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1984-01-17 US disclosed